RECENT DEVELOPMENT OF HIGH-DENSITY PLASMA SOURCES FOR SEMICONDUCTOR PROCESSING
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概要
- 論文の詳細を見る
- 1997-12-15
著者
関連論文
- Dechuck Operation of Coulomb Type and Johnsen-Rahbek Type of Electrostatic Chuck Used in Plasma Processing
- Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasmas
- Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma
- Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : II. Absolute Cross Sections
- Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : I. Relative Cross Sections
- Dissociative Ion Yields on Metal Surfaces Bombarded with Low-Energy Fluorocarbon Ions
- Observation of Ion Scattering from Metal Surfaces Bombarded with Low-Energy Hydrocarbon Ions
- Generation of a Large Electron Beam for Plasma Processing
- Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge
- RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement
- Space- and Time-Resolved Measurements of Negative Ions in a Pulsed Inductively-Coupled Plasma in Chlorine
- A New Technology for Negative Ion Detection and the Rapid Electron Cooling in a Pulsed High-Density Etching Plasma
- Hydrogen-Reduced Carbonization by Acetylene Discharges
- Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
- Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma
- LOW-TEMPERATURE FORMATION OF poly-Si FILMS BY INDUCTIVELY-COUPLED SILANE PLASMA
- Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
- Spatial Distribution and Surface Loss of CF_3 and CF_2 Radicals in a CF_4 Etching Plasma
- Radial Density Profile of Microwave Plasma for Wall Conditioning in a Purely Toroidal Magnetic Field (小特集 粒子・熱制御とプラズマ対向材料研究の進展--IEA/TEXTOR共同研究の成果と現状)
- High Speed Cleaning of Boronized Wall with a CF_4 Containing Plasma
- Rapid Cleaning of Boronized Walls with a Chlorine/Hydrogen Glow Discharge
- A Radio Frequency Driven DC Electron Beam Source
- Dramatic Improvement of Surface Wave Plasma Performance Using a Corrugated Dielectric Plate : Nuclear Science, Plasmas, and Electric Discharges
- Dependence of Fluorocarbon Plasma Chemistry on the Electron Energy Distribution Function
- Mode Conversion and Electron Heating by Oblique Injection of the Ordinary Mode into Over-Dense Plasma
- Electron Heating by Oblique Injection of Ordinary Mode into Overdense Plasma
- Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
- Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
- Cross Section Measurements for Electron-Impact Dissociation of CHF_3 into Neutral and Ionic Radicals
- Cross Sections for Electron-Impact Dissociation of Alternative Etching Gas, C_3HF_7O
- Test-Wave Measurements of Microwave Absorption Efficiency in a Planar Surface-Wave Plasma Reactor
- Production of Low-Pressure Planar Non-Magnetized Plasmas Sustained under a Dielectric-Free Metal-Plasma Interface
- Production and Control of Low-Pressure Ar and CF_4 Plasmas Using Surface Waves
- Cross Section Measurements for Electron-Impact Dissociation of C_4F_8 into Neutral and Ionic Radicals
- High-Speed Etching of Indium-Tin-Oxide Thin Films Using an Inductively Coupled Plasma ( Plasma Processing)
- Design of Large-Area Surface Wave Plasma Excited by Slotted Waveguide Antennas with Novel Power Divider
- Whistler Wave Trapping in a Narrow Density Trough
- Observation of Transit-Time Electron Heating by Localize RF Field
- Transit-Time RF Heating of Plasma Based on Fermi Acceleration
- Dispersion and Attenuation of Whistler Waves in a Finite Plasma
- A New Approach to Boronization of Fusion Devices
- Two-Dimensional Modeling of Slot-Excited Surface Waves in Bounded Planar Plasmas
- Radical Control by Wall Heating of a Fluorocarbon Etching Reactor
- Absolute Fluorine Atom Densities in Fluorocarbon High-Density Plasmas Measured by Appearance Mass Spectrometry
- Negative Ion Transfer Model of Low-Temperature Oxidation of Silicon Surface by High-Density Microwave Plasma
- Optical Emission and Microwave Field Intensity Measurements in Surface Wave-Excited Planar Plasma
- Pressure Dependence of Carbon Film Coating by a Toroidal Methane Discharge
- Free Radicals in an Inductively Coupled Etching Plasma
- Excitation of Azimuthally Propagating Ion-Cyclotron Drift Waves in Large Magnetized Plasma : Nuclear Science, Plasmas and Electric Discharges
- Ion Cyclotron Drift Waves in Plasmas with Controlled Radial Density Distributions
- Plasma Oscillation Method for Measurements of Absolute Electron Density in Plasma
- Mechanism of Cross-Field Heating of Ions
- Wall Temperature Dependence of Boronization Using Decaborane and Diborane
- Resonant Directional Excitation of Helicon Waves by a Helical Antenna
- Hot Spots and Electron Heating Processes in a Helicon-Wave Excited Plasma
- Low-Frequency Electrostatic Waves in a Weakly Ionized Plasma under a Weak Magnetic Field
- Radical Kinetics in a Fluorocarbon Etching Plasma
- RECENT DEVELOPMENT OF HIGH-DENSITY PLASMA SOURCES FOR SEMICONDUCTOR PROCESSING
- Partial Cross Sections for Electron Impact Dissociation of CF_4 into Neutral Radicals
- INFLUENCE OF ION-INDUCED RADICAL DESORPTION FROM FLUOROCARBON DEPOSITS IN A HIGH DENSITY PLASMAS
- Surface Wave Eigenmodes in a Finite-Area Plane Microwave Plasma
- External Excitation of Space Charge Waves in RF Discharges
- Modeling Microwave Resonance of Curling Probe for Density Measurements in Reactive Plasmas
- Characteristics of Ultrahigh-Frequency Surface-Wave Plasmas Excited at 915 MHz
- Novel Antenna Coupler Design for Production of Meter-Scale High-Density Planar Surface Wave Plasma
- Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
- New Inductive rf Discharge Using an Internal Metal Antenna
- Electrostatic Coupling of Antenna and the Shielding Effect in Inductive RF Plasmas
- Effect of Sputtering Deposition Process on Magnetic Properties of Magnetic Multilayers
- Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H2/SiH4 Plasma
- Suppression of High-Energy Backscattered Particles in Magnetron Plasma Using Cylindrical Cathode
- Dependences of Giant Magnetoresistance in Co/Cu Multilayers on Sputtering Conditions
- Electron Density Range Measurable by Microwave Resonator Probe with Higher Mode Resonance
- Cross Section Measurements for Electron-Impact Dissociation of C 4F 8 into Neutral and Ionic Radicals
- Opto-Curling Probe for Simultaneous Monitoring of Optical Emission and Electron Density in Reactive Plasmas
- Mode Jumps and Hysteresis in Surface-Wave Sustained Microwave Discharges
- Mechanism of Oxidation of Si Surfaces Exposed to O2/Ar Microwave-Excited Plasma
- Multi-Hollow Plasma Production along Dielectric Plate in Microwave Discharge
- Plasma Effects on Electrostatic Chuck Characteristics on Capacitive RF Discharge
- Influence of Excitation Frequency on the Electron Distribution Function in Capacitively Coupled Discharges in Argon and Helium
- Temporal Analysis of Electrostatic Chuck Characteristics in Inductively Coupled Plasma
- Negative Ion Transfer Model of Low-Temperature Oxidation of Silicon Surface by High-Density Microwave Plasma
- Hydrogen Release and Retention Dynamics of Amorphous Carbon Layers Exposed to a Hydrogen/Helium Plasma