New Inductive rf Discharge Using an Internal Metal Antenna
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概要
- 論文の詳細を見る
In conventional ICP (or TCP) reactors, a rf power is inductively coupled to an antenna placed outside a plasma vessel. Such an external coupling system is known to have several disadvantages. In order to avoid these disadvantages, a new internal coupling system has been developed in which a bare metal antenna is directly immersed in a plasma, thus forming a full metal reactor. This is accomplished by generating magnetic field lines around an antenna conductor, which effectively suppress the electron loss at the antenna and hence suppress the anomalous rise of plasma potential. Magnetic fields near the antenna are formed by superposing a dc current on rf current along the antenna. This type of ICP enables rf discharges at rather low pressures such as 〜3×10^<-4> Torr due to the magnetron effect. Other characteristics of internal metal antennas are also discussed.
- 社団法人応用物理学会の論文
- 1995-12-15
著者
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Nakamura Keiji
Department Of Electrical Engineering School Of Engineering Nagoya University
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Sugai Hideo
Department O Electrical Engineering Nagoya University
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Nakamura Keiji
Department Of Biology And Geosciences Graduate School Of Science Osaka City University:present Addre
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KUWASHITA Yukiyasu
Department of Electrical Engineering, School of Engineering, Nagoya University
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Kuwashita Yukiyasu
Department Of Electrical Engineering School Of Engineering Nagoya University
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