Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature

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概要

• 論文の詳細を見る
• Japan Society for Analytical Chemistryの論文
• 2010-02-10

著者

• Kawamura Ichiro

  Central Research And Development Laboratory Showa Shell Sekiyu K.k.

• Nakamura K

  Display Device Research And Development Department Nippondenso Co. Ltd.

• Nakamura Keiji

  Department Of Electrical Engineering School Of Engineering Nagoya University

• Ichimura S

  National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn

• Nakamura K

  Nagoya University Department Of Electrical Engineering

• NONAKA Hidehiko

  National Institute of Advanced Industrial Science and Technology (AIST)

• ICHIMURA Shingo

  National Institute of Advanced Industrial Science and Technology (AIST)

• Nakamura K

  Tokyo Electron Ltd. Tokyo Jpn

• Nakamura Kentaro

  湘南工科大学

• 中村 僖良

  National Institute Of Advanced Industrial Science And Technology (aist)

• KAMEDA Naoto

  Meidensha Corporation

• NISHIGUCHI Tetsuya

  Meidensha Corporation

• MORIKAWA Yoshiki

  Meidensha Corporation

• KEKURA Mitsuru

  Meidensha Corporation

• NAKAMURA Ken

  National Institute of Advanced Industrial Science and Technology (AIST)

• USHIYAMA Tomoharu

  National Institute of Advanced Industrial Science and Technology (AIST)

• Ichimura Shingo

  National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn

• Morikawa Y

  Meidensha Corporation

• Nonakai Hidehiko

  National Institute Of Advanced Industrial Science And Technology (aist)

• Nishiguchi T

  Meidensha Corporation

• NAKAMURA Ken

  National Institute for Agro-Environmental Sciences

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