NONAKA Hidehiko | National Institute of Advanced Industrial Science and Technology (AIST)

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概要

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著作論文

Production of Stable Ion Beam of Os_3(CO)_ with Compact Metal-Cluster-Complex Ion Source
Rapid and Uniform SiO_2 Film Growth on 4inch Si Wafer Using 100%-O_3 Gas
Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature
Relationship between Ozone Oxidation and Stress Evolution on an H-Terminated Si Surface
Nanoscale-order Homogeneous Structure of SiO_2 Film on Poly-silicon Grown at Room Temperature using UV Light Excited Ozone
Rapid and Uniform SiO2 Film Growth on 4 inch Si Wafer Using 100%-O3 Gas
Mass Markers for Time-of-Flight Secondary Ion Mass Spectrometry Spectrum in a Large Mass Region Using Ir4(CO)12 Metal Cluster Complex Sample
Ion Beam Generation from an Electrolyte Solution Containing Polyatomic Cations and Anions for Secondary Ion Mass Spectrometry
Improvement in Chemical-Vapor-Deposited-SiO2 Film Properties by Annealing with UV-Light-Excited Ozone
Low-Temperature Oxidation of Silicon using UV-Light-Excited Ozone
Advantage of Highly Concentrated (${\geq}90$%) Ozone for Chemical Vapor Deposition SiO2 Grown under 200 °C Using Hexamethyldisilazane and Ultraviolet Light Excited Ozone
Measured Gas Concentrations and Flow Properties in SiH4–H2 Mixtures
Photochemical Reaction of Ozone and 1,1,1,3,3,3-Hexamethyldisilazane: Analysis of the Gas Reaction between Precursors in a Photochemical Vapor Deposition Process
Secondary Ion Mass Spectrometry of Organic Thin Films Using Metal-Cluster-Complex Ion Source
Relationship between Ozone Oxidation and Stress Evolution on an H-Terminated Si Surface
Secondary-Ion-Mass-Spectrometry Depth Profiling of Ultra-shallow Boron Delta Layers in Silicon with Massive Molecular Ion Beam of Ir4(CO)7+
Beam-induced Nanoscale Ripple Formation on Silicon with the Metal-Cluster-Complex Ion of Ir4(CO)7+

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