Beam-induced Nanoscale Ripple Formation on Silicon with the Metal-Cluster-Complex Ion of Ir4(CO)7+
スポンサーリンク
概要
- 論文の詳細を見る
The surface topography of Si(100) bombarded with 2.5–10 keV Ir4(CO)7+ at an incident angle of 45° was investigated by atomic force microscopy. Experimental results showed that self-organized ripple structures with a wavelength below 30 nm were produced at a beam energy of 5 keV. It was found that the wavelength of the ripples increased with decreasing beam energy, which is different from results obtained using conventional ion beams. In addition, surface roughness proved to increase with decreasing beam energy. The phenomena were explained by considering a substantial decrease in sputtering yield and the subsequent compositional change in the target at lower-beam-energy Ir4(CO)7+ bombardment. Furthermore, the surface roughness was also confirmed to increase with increasing oxygen partial pressure.
- Japan Society of Applied Physicsの論文
- 2007-09-25
著者
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Itoh Hiroshi
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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FUJIWARA Yukio
National Institute of Advanced Industrial Science and Technology (AIST)
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KONDOU Kouji
National Institute of Advanced Industrial Science and Technology (AIST)
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NONAKA Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST)
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FUJIMOTO Toshiyuki
National Institute of Advanced Industrial Science and Technology (AIST)
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KUROKAWA Akira
National Institute of Advanced Industrial Science and Technology (AIST)
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Ichimura Shingo
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Tomita Mitsuhiro
Corporate Research And Development Center Toshiba Corporation
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Saito Naoaki
National Institute Of Advanced Industrial Science And Technology
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Saito Naoaki
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Watanabe Kouji
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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