Nanoscale-order Homogeneous Structure of SiO_2 Film on Poly-silicon Grown at Room Temperature using UV Light Excited Ozone
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Ichimura S
National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
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NONAKA Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST)
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KAMEDA Naoto
Meidensha Corporation
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NISHIGUCHI Tetsuya
Meidensha Corporation
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MORIKAWA Yoshiki
Meidensha Corporation
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KEKURA Mitsuru
Meidensha Corporation
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Morikawa Y
Meidensha Corporation
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Nonakai Hidehiko
National Institute Of Advanced Industrial Science And Technology (aist)
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ICHUMURA Shingo
National Institute of Advanced Industrial Science and Technology (AIST)
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Nishiguchi T
Meidensha Corporation
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