KEKURA Mitsuru | Meidensha Corporation
スポンサーリンク
概要
関連著者
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NONAKA Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST)
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MORIKAWA Yoshiki
Meidensha Corporation
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KEKURA Mitsuru
Meidensha Corporation
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NISHIGUCHI Tetsuya
Meidensha Corporation
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KAMEDA Naoto
Meidensha Corporation
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Ichimura Shingo
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Morikawa Y
Meidensha Corporation
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Nishiguchi T
Meidensha Corporation
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Ichimura S
National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
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ICHIMURA Shingo
National Institute of Advanced Industrial Science and Technology (AIST)
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Nihei Yoshimasa
Tokyo University Of Science
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Nonakai Hidehiko
National Institute Of Advanced Industrial Science And Technology (aist)
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NISHIGUCHI Tetsuya
National Institute of Advanced Industrial Science and Technology (AIST)
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SATO Yosuke
National Institute of Advanced Industrial Science and Technology (AIST)
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NOYORI Takeshi
Meidensha Corporation
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Kawamura Ichiro
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
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Nakamura K
Display Device Research And Development Department Nippondenso Co. Ltd.
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Nakamura Keiji
Department Of Electrical Engineering School Of Engineering Nagoya University
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Nakamura K
Nagoya University Department Of Electrical Engineering
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Nakamura K
Tokyo Electron Ltd. Tokyo Jpn
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Nakamura Kentaro
湘南工科大学
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中村 僖良
National Institute Of Advanced Industrial Science And Technology (aist)
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NAKAMURA Ken
National Institute of Advanced Industrial Science and Technology (AIST)
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USHIYAMA Tomoharu
National Institute of Advanced Industrial Science and Technology (AIST)
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ICHUMURA Shingo
National Institute of Advanced Industrial Science and Technology (AIST)
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Kameda Naoto
Meidensha Corporation, Core Technology Research Laboratories, Numazu, Shizuoka 410-8588, Japan
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Kekura Mitsuru
Meidensha Corporation, 515 Higashimakado Kaminakamizo, Numazu, Shizuoka 410-8588, Japan
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Kekura Mitsuru
Meidensha Corporation, Core Technology Research Laboratories, Numazu, Shizuoka 410-8588, Japan
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Sato Yosuke
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Ichimura Shingo
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Ichimura Shingo
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8565, Japan
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Nonaka Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Nihei Yoshimasa
Tokyo University of Science, 2641 Yamazaki, Noda-shi, Chiba 278-8510, Japan
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Morikawa Yoshiki
Meidensha Corporation, 515 Higashimakado Kaminakamizo, Numazu, Shizuoka 410-8588, Japan
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Morikawa Yoshiki
Meidensha Corporation, Core Technology Research Laboratories, Numazu, Shizuoka 410-8588, Japan
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NAKAMURA Ken
National Institute for Agro-Environmental Sciences
著作論文
- Rapid and Uniform SiO_2 Film Growth on 4inch Si Wafer Using 100%-O_3 Gas
- Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature
- Nanoscale-order Homogeneous Structure of SiO_2 Film on Poly-silicon Grown at Room Temperature using UV Light Excited Ozone
- Rapid and Uniform SiO2 Film Growth on 4 inch Si Wafer Using 100%-O3 Gas
- Advantage of Highly Concentrated (${\geq}90$%) Ozone for Chemical Vapor Deposition SiO2 Grown under 200 °C Using Hexamethyldisilazane and Ultraviolet Light Excited Ozone