MORIKAWA Yoshiki | Meidensha Corporation
スポンサーリンク
概要
関連著者
-
MORIKAWA Yoshiki
Meidensha Corporation
-
NISHIGUCHI Tetsuya
Meidensha Corporation
-
Morikawa Y
Meidensha Corporation
-
NONAKA Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST)
-
KEKURA Mitsuru
Meidensha Corporation
-
Nishiguchi T
Meidensha Corporation
-
Ichimura S
National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
-
Ichimura Shingo
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
-
Nonakai Hidehiko
National Institute Of Advanced Industrial Science And Technology (aist)
-
ICHIMURA Shingo
National Institute of Advanced Industrial Science and Technology (AIST)
-
KAMEDA Naoto
Meidensha Corporation
-
Nihei Yoshimasa
Tokyo University Of Science
-
NISHIGUCHI Tetsuya
National Institute of Advanced Industrial Science and Technology (AIST)
-
SATO Yosuke
National Institute of Advanced Industrial Science and Technology (AIST)
-
NOYORI Takeshi
Meidensha Corporation
-
NISHIGUCHI Tetsuya
Material & Device Research Department, Meidensha Corporation
-
MORIKAWA Yoshiki
Material & Device Research Department, Meidensha Corporation
-
MIYAMOTO Masaharu
Material & Device Research Department, Meidensha Corporation
-
Miyamoto Masaharu
Material & Device Research Department Meidensha Corporation
-
Kawamura Ichiro
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
-
Nakamura K
Display Device Research And Development Department Nippondenso Co. Ltd.
-
OKUYAMA Masanori
Department of Electrical Engineering, Facully of Engineering Science, Osaka University
-
Nakamura Keiji
Department Of Electrical Engineering School Of Engineering Nagoya University
-
Okuyama Masanori
Department Of Electrical Engineering Faculty Of Engineering Schience Osaka University
-
Nakamura K
Nagoya University Department Of Electrical Engineering
-
ICHIMURA Shingo
Electrotechnical Laboratory, Umezono
-
Nakamura K
Tokyo Electron Ltd. Tokyo Jpn
-
Nakamura Kentaro
湘南工科大学
-
中村 僖良
National Institute Of Advanced Industrial Science And Technology (aist)
-
NAKAMURA Ken
National Institute of Advanced Industrial Science and Technology (AIST)
-
USHIYAMA Tomoharu
National Institute of Advanced Industrial Science and Technology (AIST)
-
Ichimura Shingo
Electrotechnical Laboratory
-
ICHUMURA Shingo
National Institute of Advanced Industrial Science and Technology (AIST)
-
Xu Huaping
Department Of Engineering Science Graduate School Of Engineering Science Osaka University
-
NONAKA Hidehiko
Electrotechnical Laboratory
-
KIYOMOTO Tomofumi
Department of Engineering Science, Graduate School of Engineering Science, Osaka University
-
MORIKAWA Yasuomi
Department of Engineering Science, Graduate School of Engineering Science, Osaka University
-
LIN Chenglu
National Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy, Chine
-
Lin Chenglu
National Laboratory Of Functional Materials For Informatics Shanghai Institute Of Metallurgy Chinese
-
Kiyomoto Tomofumi
Department Of Engineering Science Graduate School Of Engineering Science Osaka University
-
Kameda Naoto
Meidensha Corporation, Core Technology Research Laboratories, Numazu, Shizuoka 410-8588, Japan
-
Kekura Mitsuru
Meidensha Corporation, 515 Higashimakado Kaminakamizo, Numazu, Shizuoka 410-8588, Japan
-
Kekura Mitsuru
Meidensha Corporation, Core Technology Research Laboratories, Numazu, Shizuoka 410-8588, Japan
-
Sato Yosuke
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Ichimura Shingo
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Ichimura Shingo
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8565, Japan
-
Nonaka Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Nihei Yoshimasa
Tokyo University of Science, 2641 Yamazaki, Noda-shi, Chiba 278-8510, Japan
-
Morikawa Yoshiki
Meidensha Corporation, 515 Higashimakado Kaminakamizo, Numazu, Shizuoka 410-8588, Japan
-
Morikawa Yoshiki
Meidensha Corporation, Core Technology Research Laboratories, Numazu, Shizuoka 410-8588, Japan
-
NAKAMURA Ken
National Institute for Agro-Environmental Sciences
著作論文
- Rapid and Uniform SiO_2 Film Growth on 4inch Si Wafer Using 100%-O_3 Gas
- Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature
- Nanoscale-order Homogeneous Structure of SiO_2 Film on Poly-silicon Grown at Room Temperature using UV Light Excited Ozone
- Hyperthermal Beam for Oxidation and Nitridation Produced by Laser Evaporation of MiXed O_3/N_2O Cryogenic Film : Surfaces, Interfaces, and Films
- Hyperthermal O_3 Beam Produced by Laser Ablation of Solid-Ozone Film
- Hydrothermal Transformation of Gel Pb(Zr_, Ti_)O_3 Thin Films into Perovskite Phase at Low Temperature of 160℃
- Rapid and Uniform SiO2 Film Growth on 4 inch Si Wafer Using 100%-O3 Gas
- Advantage of Highly Concentrated (${\geq}90$%) Ozone for Chemical Vapor Deposition SiO2 Grown under 200 °C Using Hexamethyldisilazane and Ultraviolet Light Excited Ozone