Ichimura S | National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
スポンサーリンク
概要
- ICHIMURA Shingoの詳細を見る
- 同名の論文著者
- National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpnの論文著者
関連著者
-
Ichimura S
National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
-
ICHIMURA Shingo
Electrotechnical Laboratory, Umezono
-
Ichimura Shingo
Electrotechnical Laboratory
-
Shimizu H
Nihon Kesso Koogaku Co. Ltd. Gunma Jpn
-
Shimizu H
National Inst. Materials And Chemical Res. Ibaraki Jpn
-
KOKUBUN Kiyohide
Electrotechnical Laboratory, Umezono
-
Shimizu Hirofumi
High-technology Research Center And Faculty Of Engineering Kansai University
-
Shimizu Hirofumi
Semiconductor And Integrated Circuits Division Hitachi Ltd.
-
Shimizu H
High-technology Research Center And Faculty Of Engineering Kansai University
-
Kokubun Kiyohide
Electrotechnical Laboratory Umezono
-
Sekine S
Electrotechnical Laboratory
-
KOKUBUN Kiyohide
Electrotechnical Laboratory
-
SHIMIZU Hazime
Electrotechnical Laboratory, Umezono
-
Shimizu Hazime
Electrotechnical Laboratory
-
SEKINE Shigeyuki
Electrotechnical Laboratory, Umezono
-
Sekine Shigeyuki
Electrotechnical Laboratory
-
Shimizu Hideaki
Department Of Reaction Chemistry Faculty Of Engineering The University Of Tokyo
-
KUROKAWA Akira
Electrotechnical Laboratory, Umezono
-
NISHIGUCHI Tetsuya
Meidensha Corporation
-
MORIKAWA Yoshiki
Meidensha Corporation
-
Morikawa Y
Meidensha Corporation
-
Nonakai Hidehiko
National Institute Of Advanced Industrial Science And Technology (aist)
-
Kurokawa A
National Institute Of Advanced Industrial Science And Technology (aist)
-
Nishiguchi T
Meidensha Corporation
-
Kurokawa Akira
Electrotechnical Laboratory
-
Wada T
Department Of Materials Chemistry Ryukoku University
-
Sugiyama Y
Jst‐crest Ibaraki Jpn
-
Wada Takao
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
-
Wada T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
-
Sugiyama Yasuyuki
Ntt Interdisciplinary Research Laboratories:(present Address) Science And Technology Agency
-
IWASAKI Akira
Electrotechnical Laboratory
-
NONAKA Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST)
-
ICHIMURA Shingo
National Institute of Advanced Industrial Science and Technology (AIST)
-
KOMURO Masanori
Electrotechnical Laboratory
-
SUGIYAMA Yoshinobu
Electrotechnical Laboratory
-
Iwasaki A
Department Of Physics Toyama University
-
Wada T
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
-
WADA Toshimi
Electrotechnical Laboratory
-
KANAYAMA Toshihiko
National Institute for Advanced Interdisciplinatry Research
-
KAMEDA Naoto
Meidensha Corporation
-
KEKURA Mitsuru
Meidensha Corporation
-
Ichimura Shingo
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
-
Komuro M
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
-
NISHIGUCHI Tetsuya
Material & Device Research Department, Meidensha Corporation
-
MORIKAWA Yoshiki
Material & Device Research Department, Meidensha Corporation
-
MIYAMOTO Masaharu
Material & Device Research Department, Meidensha Corporation
-
Miyamoto Masaharu
Material & Device Research Department Meidensha Corporation
-
Kanayama Toshihiko
National Inst. Of Advanced Industrial Sci. And Technol. Ibaraki Jpn
-
Kawamura Ichiro
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
-
Nakamura K
Display Device Research And Development Department Nippondenso Co. Ltd.
-
Wada T
Ryukoku Univ. Otsu Jpn
-
Nakamura Keiji
Department Of Electrical Engineering School Of Engineering Nagoya University
-
Nakamura K
Nagoya University Department Of Electrical Engineering
-
HASHIZUME Hiroko
Electrotechnical Laboratory
-
ICHIMURA Shingo
Elecrotechnical Laboratory
-
SEKINE Shigeyuki
Elecrotechnical Laboratory
-
Joachim STEFFEN
Elecrotechnical Laboratory
-
KOKUBUN Kiyohide
Elecrotechnical Laboratory
-
SHIMIZU Hazime
Elecrotechnical Laboratory
-
SEKINE Sigeyuki
Electrotechnical Laboratory
-
SHIMIZU Hajime
Electrotechnical Laboratory
-
GOTO Keisuke
Nagoya Institute of Technology
-
MATSUURA Shigeki
Hamamatsu Photonics, K. K.
-
Nakamura K
Tokyo Electron Ltd. Tokyo Jpn
-
Nakamura Kentaro
湘南工科大学
-
MISAWA Shunji
Electrotechnical Laboratory
-
中村 僖良
National Institute Of Advanced Industrial Science And Technology (aist)
-
Joachim Steffen
Elecrotechnical Laboratory:(present Address) Institute For Ion Beam Physics And Materials Research R
-
NAKAMURA Ken
National Institute of Advanced Industrial Science and Technology (AIST)
-
USHIYAMA Tomoharu
National Institute of Advanced Industrial Science and Technology (AIST)
-
ICHUMURA Shingo
National Institute of Advanced Industrial Science and Technology (AIST)
-
Misawa S
Tsukuba Institute For Super Materials Ulvac Japan Ltd.
-
NONAKA Hidehiko
Electrotechnical Laboratory
-
Matsuura S
Hamamatsu Photonics K. K.
-
Hashizume H
Electrotechnical Laboratory
-
NAKAMURA Ken
National Institute for Agro-Environmental Sciences
著作論文
- Sensitivity of Ion-Imaging Method and Mass Analysis using an Imaging Detector
- Direct Estimation of the Ionization Region for XHV Measurement by Laser Ionization
- Pressure Measurement by Photoelectron Counting
- Pressure Measurement in XHV Region Using Nonresonant Multiphoton Ionization by Picosecond Pulsed Laser
- Excimer Laser Ablation of Cryogenic NO_2 Films
- Direct Imaging of Spatial Distribution of Ions Generated by Nonresonant Multiphoton Ionization of H_2 Gas
- Preliminary Pressure Measurement in the Range of 10^ Pa Using a Picosecond Pulsed Laser
- Nonresonant Multiphoton Ionization of H_2, CO and CO_2 by Second Harmonics of Picosecond YAG Laser
- Measurement of Extreme-High-Vacuum Pressure by Laser Ionization
- Multiphoton Ionization of Xe and Kr Atoms by an ArF Excimer Laser
- A New Ion Counting System Devised for Mass-Selective Detection of Sputtered Neutrals in Laser SNMS
- Nonresonant Multiphoton Ionization of He and Ne Atoms
- Annealing Behavior of Irradiation-Induced Damagein an AlGaAs/GaAs Heterostructure by Low-Ertergy Electron Beam
- Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature
- Nanoscale-order Homogeneous Structure of SiO_2 Film on Poly-silicon Grown at Room Temperature using UV Light Excited Ozone
- Hyperthermal Beam for Oxidation and Nitridation Produced by Laser Evaporation of MiXed O_3/N_2O Cryogenic Film : Surfaces, Interfaces, and Films
- Hyperthermal O_3 Beam Produced by Laser Ablation of Solid-Ozone Film
- Comparison of the Counting Efficiencies of an Imaging Counter and Electric-pulse Counter
- Preliminary Measurement of H_2 Pressure through Detection of Photoelectrons in Vacuum Range from 10^ to 10^ Pa
- Effects of Electron Irradiation on Two-Dimensional Electron Gas in AlGaAs/GaAs Heterostructure