Shimizu Hirofumi | High-technology Research Center And Faculty Of Engineering Kansai University
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概要
関連著者
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Shimizu Hirofumi
High-technology Research Center And Faculty Of Engineering Kansai University
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Shimizu Hirofumi
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Shimizu H
High-technology Research Center And Faculty Of Engineering Kansai University
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Shimizu H
Nihon Kesso Koogaku Co. Ltd. Gunma Jpn
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Shimizu H
National Inst. Materials And Chemical Res. Ibaraki Jpn
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Shimizu Hideaki
Department Of Reaction Chemistry Faculty Of Engineering The University Of Tokyo
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ICHIMURA Shingo
Electrotechnical Laboratory, Umezono
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KOKUBUN Kiyohide
Electrotechnical Laboratory, Umezono
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Ichimura Shingo
Electrotechnical Laboratory
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Kokubun Kiyohide
Electrotechnical Laboratory Umezono
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SHIMIZU Hazime
Electrotechnical Laboratory, Umezono
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Shimizu Hazime
Electrotechnical Laboratory
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KOKUBUN Kiyohide
Electrotechnical Laboratory
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Ichimura S
National Inst. Advanced Industrial Sci. And Technol.(aist) Ibaraki Jpn
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Sekine S
Electrotechnical Laboratory
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SEKINE Shigeyuki
Electrotechnical Laboratory, Umezono
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Sekine Shigeyuki
Electrotechnical Laboratory
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HONMA Noriaki
Central Research Laboratory, Hitachi, Ltd.
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MUNAKATA Chusuke
Central Research Laboratory, Hitachi, Ltd.
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Honma N
Central Research Laboratory Hitachi Ltd.
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Honma Noriaki
Central Research Laboratory Hitachi Lid.
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Munakata C
Tohoku Inst. Technol. Sendai Jpn
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Munakata Chusuke
Central Research Laboratory Hitachi Lid.
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Munakata Chusuke
Central Res. Lab. Hitachi Ltd.
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TOGANO Kazumasa
National Institute for Materials Science
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KUMAKURA Hiroaki
National Research Institute for Metals, Sengen
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SHIMIZU Hirofumi
Semiconductor Design & Development Center, Hitachi, Ltd.
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SHIMIZU Hirofumi
Kofu Branch, Musashi Works, Hitachi Ltd.,
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Kumakura Hiroaki
National Institute For Materials Science
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Shimizu Hirofumi
Kofu Branch Musashi Works Of Hitachi Ltd
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Shimizu Hirofumi
Semiconductor & Integrated Circuits Division Hitachi Lid.
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Kumakura Hiroaki
National Inst. For Materials Sci. Ibaraki Jpn
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IWASAWA Yasuhiro
Department of Chemistry, Graduate School of Science, The University of Tokyo
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SHIMIZU Hitoshi
National Research Institute for Metals, Tsukuba Laboratories
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KUROKAWA Akira
Electrotechnical Laboratory, Umezono
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HASHIZUME Hiroko
Electrotechnical Laboratory
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MIZUTANI Wataru
JRCAT, National Institute for Advanced Interdisciplinary Research
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Kurokawa A
National Institute Of Advanced Industrial Science And Technology (aist)
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Iwasawa Yasuhiro
Department Of Chemistry Graduate School Of Science The University Of Tokyo
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Kurokawa Akira
Electrotechnical Laboratory
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Mizutani W
National Inst. Advanced Ind. Sci. And Technol. Ibaraki Jpn
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Hashizume H
Electrotechnical Laboratory
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Iwasawa Yasuhiro
Department of Applied Chemistry, Faculty of Engineering, Yokohama National University
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Kawamura Ichiro
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
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TACHIKAWA Kyoji
Faculty of Engineering, Tokai University
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中村 僖良
東北大学大学院工学研究科
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中村 僖良
東北大院・工
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Yokota Kazuaki
Department Of Molecular Chemistry Graduate Shool Of Engineering Hokkaido University
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MAEDA Hiroshi
National Research Institute for Metals, Sengen
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Fujita Masato
Kofu Operation Of Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Saito Hironobu
Fukushima Toyo Communication Equipment Co. Ltd.
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Fukui Ken-ichi
Department Of Chemistry Graduate Of Science The University Of Tokyo
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Koide Akira
Nihon Kesso Koogaku Co. Ltd.
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Maeda H
National Research Inst. Metals Ibaraki
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YOKOTA Katsuhiro
Faculty of Engineering, Kansai University
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TAKAHASHI Kazuhiko
National Research Institute for Metals, Tsukuba Laboratories
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SAITO Hisao
NTT Basic Research Laboratories
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Nakamura K
Department Of Electrical Engineering School Of Engineering Nagoya University
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SHIMIZU Hajime
Electrotechnical Laboratory
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Nakamura K
Tokyo Electron Ltd. Tokyo Jpn
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Tachikawa Kyoji
Tokai University
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SUGINO Yuji
Kofu, Operation of Semiconductor and Integrated Circuits Division, Hitachi Ltd.
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NAKAMURA Kazuhiro
High-Technology Research Center and Faculty of Engineering, Kansai University
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KODERA Jun
High-Technology Research Center and Faculty of Engineering, Kansai University
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YOKOTA Katsuhiro
High-Technology Research Center and Faculty of Engineering, Kansai University
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Ken-ichi Fukui
Department Of Chemistry Graduate School Of Science The University Of Tokyo
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Takahashi Kazuhiko
National Research Institute For Metals Tsukuba Laboratories:sanyo Elect. Co. Ltd.
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Sugino Yuji
Kofu Operation Of Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Saito T
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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SHIMIZU Hajime
Nihon Kesso Koogaku Co., Ltd.
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SAITO Toshihiko
Nihon Kesso Kogaku Co., Ltd.
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MIZUTANI Wataru
Surface Engineering Section, Electrotechnical Laboratory
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SHIMIZU Hazime
Surface Engineering Section, Electrotechnical Laboratory
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WATANABE Hiroshi
Fukushima National College of Technology
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SHIMIZU Hiroshi
Aomori University
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INUKAI Junji
Department of Chemistry, Faculty of Science, The University of Tokyo
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Kodera Jun
High-technology Research Center And Faculty Of Engineering Kansai University
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Saito H
Nec Corp. Ibaraki Jpn
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Watanabe Hiroshi
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies(aset) At
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Tachikawa K
Tokai Univ. Kanagawa Jpn
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Tachikawa K
Tokai University
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Watanabe H
Tokyo Univ. Pharmacy And Life Sci. Tokyo Jpn
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INUKAI Junji
Fuel Cell Nanomaterials Center, University of Yamanashi
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Inukai J
Fuel Cell Nanomaterials Center University Of Yamanashi
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Inukai Junji
Department Of Applied Chemistry Faculty Of Engineering Tohoku University
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SAITO Hideaki
Laser Laboratory, Second Research Center, TRDI, Japan Defense Agency
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Yokota K
Kobe Univ. Kobe Jpn
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Fujita M
Shizuoka Univ. Shizuoka Jpn
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Yokota Katsuhiro
High-technology Research Center And Faculty Of Engineering Kansai University
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Nakamura Kazuhiro
High-technology Research Center And Faculty Of Engineering Kansai University
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Maeda Hiroshi
National Fisheries University
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大西 洋
財団法人神奈川科学技術アカデミー
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ONISHI Hiroshi
Department of Chemistry, Faculty of Science, Kobe University
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中村 圭二
中部大学
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MATSUMOTO Yuji
Electrotechnical Laboratory
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Morimoto T
Research Center Asahi Glass Co. Ltd.
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大西 洋
(財)神奈川科学技術アカデミー・極限表面反応プロジェクト
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ENDO Kazuhiro
Electrotechnical Laboratory
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MORIMOTO Takeshi
Research Center, Asahi Glass Co., Ltd.
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IRISAWA Naoshi
Research Center, Asahi Glass Co. Ltd.
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MORIMOTO Takeshi
Osaka University
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UEHARA Mitsuru
National Research Institute for Metals
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NAKAO Masao
National Research Institute for Metals, Tsukuba Laborutories
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Nagasawa K
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Nagasawa Koichi
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Kanai A
Semiconductor Design & Development Center Hitachi Ltd.
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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AOKI Shigeru
Central Research Laboratry, Hitachi Ltd.
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KOSAKA Yuji
Semiconductor Design & Development Center, Hitachi, Ltd.
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OTA Masaya
Kofu Branch of Musashi Works, Hitachi Ltd.,
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IWASAKI Akira
Electrotechnical Laboratory
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ICHIMURA Shingo
Elecrotechnical Laboratory
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SEKINE Shigeyuki
Elecrotechnical Laboratory
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Joachim STEFFEN
Elecrotechnical Laboratory
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KOKUBUN Kiyohide
Elecrotechnical Laboratory
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SHIMIZU Hazime
Elecrotechnical Laboratory
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SEKINE Sigeyuki
Electrotechnical Laboratory
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GOTO Keisuke
Nagoya Institute of Technology
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MATSUURA Shigeki
Hamamatsu Photonics, K. K.
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OOWADANO Yoshiro
Electrotechnical Laboratory
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TAKEDA Kazuo
Central Research Lab., Hitachi, Lid.
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ISOMAE Seiichi
Central Research Lab., Hitachi, Lid.
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Togano Kazumasa
National Research Institute For Metals
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Togano Kazumasa
National Research Institute For Metals Tsukuba Laboratories
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SHIMIZU Hitoshi
Furukawa Electric Co., Ltd.
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Takeda K
Hitachi Ltd. Tokyo Jpn
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SUZUKI Norio
Semiconductor and Integrated Circuits Division, Hitachi Ltd.
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KIYOTA Shogo
Semiconductor and Integrated Circuits Division, Hitachi Ltd.
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FUJITA Masato
Kofu, Operation of Semiconductor and Integrated Circuits Division, Hitachi Ltd.
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Nakao Masao
Sanyo Electric. Co. Ltd. Tsukuba Research Center
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Nakao Masao
Sanyo Tsukuba Research Center
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AOSHIMA Takaaki
Musashi Works of Hitachi Ltd.
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SUGINO Yuji
Kofu Branch, Musashi Works of Hitachi Lid.
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Morimoto Takeshi
Research Center Asahi Glass Co. Ltd.
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Kiyota Shogo
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Iwasaki A
Department Of Physics Toyama University
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Morimoto T
Kobe Steel Ltd. Hyogo
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Morimoto T
Department Of Communications Engineering Osaka University
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SAITO Kazuhiro
Electrotechnical Laboratory
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MIZUTANI Wataru
Electrotechnical Laboratory
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Joachim Steffen
Elecrotechnical Laboratory:(present Address) Institute For Ion Beam Physics And Materials Research R
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ICHIMURA Shingo
Surface Engineering Section, Electrotechnical Laboratory
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FUKUI Ken-ichi
Surface Engineering Section, Electrotechnical Laboratory
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NAGANUMA Takashi
Kofu Works, Hitachi, Ltd.
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KANAI Akira
Semiconductor Design & Development Center, Hitachi, Ltd.
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UMEMURA Nobuaki
Semiconductor Design & Development Center, Hitachi, Ltd.
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Ichimura Shingo
Surface Engineering Section Electrotechnical Laboratory
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Ota Masaya
Kofu Branch Of Musashi Works Hitachi Ltd.
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Kosaka Yuji
Semiconductor Design & Development Center Hitachi Ltd.
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Nakao M
Ntt
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Uehara M
Matsushita Techno‐res. Co. Ltd. Osaka Jpn
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Irisawa Naoshi
Research Center Asahi Glass Co. Ltd.
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Matsuura S
Hamamatsu Photonics K. K.
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Saito T
School Of Engineering Nagoya University
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Naganuma Takashi
Kofu Works Hitachi Ltd.
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Shimizu Hitoshi
Furukawa Electric Co. Ltd.
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Umemura N
Faculty Of Photonics Science Chitose Institute Of Science And Technology
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Aoki Shigeru
Central Research Laboratory Hitachi Ltd.
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Aoki Shigeru
Central Research Laboratry Hitachi Ltd.
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Takeda Kazuo
Central Research Laboratory Hitachi Ltd.
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Takeda Kazuo
Central Research Lab. Hitachi Ltd.
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Onishi Hiroshi
Department F Genetic Information Division Of Molecular Life Science School Of Medicine Tokai Univers
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Suzuki Norio
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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KOIDE Akira
Nihon Kessho Koogaku Co., Ltd.
著作論文
- Superconducting Properties of Ba-Y-Cu-O Tape Prepared by the Doctor Blade Process : Electrical Properties of Condensed Matter
- Magnetic Properties and Upper Critical Fields of Sintered Tl-Ca-Ba-Cu-O Supercouiductors : Electrical Properties of Condensed Matter
- Upper Critical Field of New Oxide Superconductor Bi-Sr-Ca-Cu-O : Electrical Properties of Condensed Matter
- Simplified AC Photovoltaic Measurermemt of Minority Carrier Lifetime in Czochralski-Grown Silicon Wafers Having Ring-Distributed Stacking Faults
- Observation of Ring-Distributed Microdefects in Czochralski-Grown Silicon Wafers with a Scanning Photon Microscope and Its Diagnostic Application to Device Processing
- Comparison of Minority Carrier Lifetimes Measured by Photoconductive Decay and ac Photovoltaic Method : Techniques, Instrumentations and Measurement
- Nondestructive Observations of Surface Flaws and Contaminations in Silicon Wafers by Means of a Scanning Photon Microscope : Semiconductors and Semiconductor Devices
- Calibration of Minority Carrier Lifetimes Measured with an ac Photovoltaic Method : Techniques, Instrumentations and Measurement
- Sensitivity of Ion-Imaging Method and Mass Analysis using an Imaging Detector
- Direct Estimation of the Ionization Region for XHV Measurement by Laser Ionization
- Pressure Measurement by Photoelectron Counting
- Pressure Measurement in XHV Region Using Nonresonant Multiphoton Ionization by Picosecond Pulsed Laser
- Excimer Laser Ablation of Cryogenic NO_2 Films
- Direct Imaging of Spatial Distribution of Ions Generated by Nonresonant Multiphoton Ionization of H_2 Gas
- Preliminary Pressure Measurement in the Range of 10^ Pa Using a Picosecond Pulsed Laser
- Nonresonant Multiphoton Ionization of H_2, CO and CO_2 by Second Harmonics of Picosecond YAG Laser
- Measurement of Extreme-High-Vacuum Pressure by Laser Ionization
- Multiphoton Ionization of Xe and Kr Atoms by an ArF Excimer Laser
- A New Ion Counting System Devised for Mass-Selective Detection of Sputtered Neutrals in Laser SNMS
- Nonresonant Multiphoton Ionization of He and Ne Atoms
- Dependence of the Nonresonant Laser Ionization of Rare Gases on Laser Wavelength
- Detection of Sputtered Neutral Atoms by Nonresonant Multiphoton Ionization : Surfaces, Interfaces and Films
- Preliminary Results of Vacuum Pressure Measurement by Laser Ionization Method
- Tape Conductor Fabrication Process for High-T_c Ba_2YCu_3O_ : Electrical Properties of Condensed Matter
- Excellence of Gate Oxide Integrity in Metal-Oxide-Semiconductor Large-Scale-Integrated Circuits Based on P^-/P^- Thin-Film Epitaxial Silicon Wafers
- Dependence of Warpage of Czochralski-Grown Silicon Wafers on Oxygen Concentration and Its Application to MOS Image-Sensor Device
- Estimation of Epitaxial Temperature Using X-Ray Diffraction for Si Films Grown on (100) Si by Molecular Beam Epitaxy
- X-Ray Diffraction from Low-Temperature-Grown Silicon Films with Small Surface Roughness
- Main Cause of Surface Waveguides Formed under LiNbO_3 Crystal Surface during Thermal Treatment
- Adsorption and Thermal or Photodecomposition of Triethylgallium and Trimethylgallium on Si(111)-7×7
- Prevention of Thermal Degradations by Using Dehydrated LiNbO_3 Crystal
- Analysis of the Thickness Edge Mode in Piezoelectric Plates and Its Application to Resonators
- Photochemical Decomposition of Triethylgallium on Si(111) Studied by Means of STM, LEED, AES and Mass Spectroscopy
- Oxidation-Induced Stacking Faults Dependent on Oxygen Concentration in Czochralski-Growrn Silicon Wafers
- Optimum Electrode Design for Effective Excitation of the Edge Mode by Taking Account of Its Electric Potential Distribution : SAW and Communication Device
- Gold Substrates for Scanning Tunneling Microscopy of Adsorbed Species