Shimizu Hirofumi | Semiconductor & Integrated Circuits Division Hitachi Lid.

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概要

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著作論文

Simplified AC Photovoltaic Measurermemt of Minority Carrier Lifetime in Czochralski-Grown Silicon Wafers Having Ring-Distributed Stacking Faults
Observation of Ring-Distributed Microdefects in Czochralski-Grown Silicon Wafers with a Scanning Photon Microscope and Its Diagnostic Application to Device Processing
Excellence of Gate Oxide Integrity in Metal-Oxide-Semiconductor Large-Scale-Integrated Circuits Based on P^-/P^- Thin-Film Epitaxial Silicon Wafers
Oxidation-Induced Stacking Faults Dependent on Oxygen Concentration in Czochralski-Growrn Silicon Wafers
Confirmation of Aluminum-Induced Negative Charge in Thermally Oxidized Silicon Wafers Using AC Surface Photovoltage Method
Effect of Aluminum on Ac Surface Photovoltages in Thermally Oxidized n-Type Silicon Wafers
Characterization of Damaged Layer Using AC Surface Photovoltage in Silicon Wafers
Nondestructive Diagnostic Method Using AC Surface Photovoltage in Silicon Wafers Rinsed with Metal-Contaminated Water Solutions
Confirmation of Aluminum-Induced Negative Charge in Native Silicon Dioxide
Monitoring of Ultra-Trace Contaminants on Silicon Wafers for ULSI by a Novel Impurity Extraction and AC Surface Photovoltage Methods
Iron-Induced Negative Charge in Thermally Grown Oxide of Silicom Wafers
Confirmation of Aluminum Distribution in Thermally Grown Oxide of Silicon Wafers
Enhanced Growth of Thermal Oxide Due to Impurity Absorption from Adjoining Contaminated Silicon Wafers
Computer Simulation of Stress Induced Dislocation Multiplication in Large-Diameter Silicon Wafer in High-Temperature Device Processing
AC Photovoltaic Images of Thermally Oxidized P-Type Silicon Wafers Contaminated with Metals

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