Oxidation-Induced Stacking Faults Dependent on Oxygen Concentration in Czochralski-Growrn Silicon Wafers

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-02-15

著者

• Shimizu H

  Nihon Kesso Koogaku Co. Ltd. Gunma Jpn

• Kanai A

  Semiconductor Design & Development Center Hitachi Ltd.

• SHIMIZU Hirofumi

  Semiconductor Design & Development Center, Hitachi, Ltd.

• Shimizu H

  National Inst. Materials And Chemical Res. Ibaraki Jpn

• Shimizu Hirofumi

  High-technology Research Center And Faculty Of Engineering Kansai University

• Shimizu Hirofumi

  Semiconductor And Integrated Circuits Division Hitachi Ltd.

• Shimizu H

  High-technology Research Center And Faculty Of Engineering Kansai University

• NAGANUMA Takashi

  Kofu Works, Hitachi, Ltd.

• KANAI Akira

  Semiconductor Design & Development Center, Hitachi, Ltd.

• UMEMURA Nobuaki

  Semiconductor Design & Development Center, Hitachi, Ltd.

• Naganuma Takashi

  Kofu Works Hitachi Ltd.

• Shimizu Hideaki

  Department Of Reaction Chemistry Faculty Of Engineering The University Of Tokyo

• Shimizu Hirofumi

  Semiconductor & Integrated Circuits Division Hitachi Lid.

• Umemura N

  Faculty Of Photonics Science Chitose Institute Of Science And Technology

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