Nondestructive Observations of Surface Flaws and Contaminations in Silicon Wafers by Means of a Scanning Photon Microscope : Semiconductors and Semiconductor Devices

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1988-08-20

著者

• Shimizu H

  Nihon Kesso Koogaku Co. Ltd. Gunma Jpn

• HONMA Noriaki

  Central Research Laboratory, Hitachi, Ltd.

• MUNAKATA Chusuke

  Central Research Laboratory, Hitachi, Ltd.

• SHIMIZU Hirofumi

  Kofu Branch, Musashi Works, Hitachi Ltd.,

• OTA Masaya

  Kofu Branch of Musashi Works, Hitachi Ltd.,

• Shimizu Hirofumi

  High-technology Research Center And Faculty Of Engineering Kansai University

• Shimizu Hirofumi

  Semiconductor And Integrated Circuits Division Hitachi Ltd.

• Shimizu H

  High-technology Research Center And Faculty Of Engineering Kansai University

• Ota Masaya

  Kofu Branch Of Musashi Works Hitachi Ltd.

• Honma N

  Central Research Laboratory Hitachi Ltd.

• Honma Noriaki

  Central Research Laboratory Hitachi Lid.

• Munakata C

  Tohoku Inst. Technol. Sendai Jpn

• Munakata Chusuke

  Central Research Laboratory Hitachi Lid.

• Shimizu Hirofumi

  Kofu Branch Musashi Works Of Hitachi Ltd

• Munakata Chusuke

  Central Res. Lab. Hitachi Ltd.

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• Comparison of Minority Carrier Lifetimes Measured by Photoconductive Decay and ac Photovoltaic Method : Techniques, Instrumentations and Measurement
• Nondestructive Observations of Surface Flaws and Contaminations in Silicon Wafers by Means of a Scanning Photon Microscope : Semiconductors and Semiconductor Devices
• Calibration of Minority Carrier Lifetimes Measured with an ac Photovoltaic Method : Techniques, Instrumentations and Measurement
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