Dependence of Warpage of Czochralski-Grown Silicon Wafers on Oxygen Concentration and Its Application to MOS Image-Sensor Device
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1986-01-20
著者
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Shimizu H
Nihon Kesso Koogaku Co. Ltd. Gunma Jpn
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Fujita Masato
Kofu Operation Of Semiconductor And Integrated Circuits Division Hitachi Ltd.
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SHIMIZU Hirofumi
Kofu Branch, Musashi Works, Hitachi Ltd.,
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SUGINO Yuji
Kofu, Operation of Semiconductor and Integrated Circuits Division, Hitachi Ltd.
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Shimizu Hirofumi
High-technology Research Center And Faculty Of Engineering Kansai University
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Shimizu Hirofumi
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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AOSHIMA Takaaki
Musashi Works of Hitachi Ltd.
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SUGINO Yuji
Kofu Branch, Musashi Works of Hitachi Lid.
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Sugino Yuji
Kofu Operation Of Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Shimizu H
High-technology Research Center And Faculty Of Engineering Kansai University
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Fujita M
Shizuoka Univ. Shizuoka Jpn
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Shimizu Hirofumi
Kofu Branch Musashi Works Of Hitachi Ltd
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