A Defect Control Technique for the Intrinsic Gettering in Silicon Device Processing
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1984-01-20
著者
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Ono Minoru
Musashi Works Of Hitachi Ltd.
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AOSHIMA Takaaki
Musashi Works of Hitachi Ltd.
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KISHINO Seigo
Musashi Works of Hitachi Ltd.
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YOSHINAKA Akira
Musashi Works of Hitachi Ltd.
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SHIMIZU Hirofumi
Musashi Works of Hitachi Ltd.
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Yoshinaka Akira
Musashi Works Hitachi Ltd.
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Shimizu Hirofumi
Musashi Works Hitachi Ltd.
関連論文
- Dependence of Warpage of Czochralski-Grown Silicon Wafers on Oxygen Concentration and Its Application to MOS Image-Sensor Device
- A Defect Control Technique for the Intrinsic Gettering in Silicon Device Processing
- Thermal Warping of Large Diameter Czochralski-Grown Silicon Wafers : Semiconductors and Semiconductor Devices
- Formation of a Stacking Fault-Free Region in Thermally Oxidized Silicon