Watanabe H | Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)

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著作論文

High-Efficiency Excitonic Emission with Deep-Ultraviolet Light from (001)-Oriented Diamond p-i-n Junction
Electron-Beam-Induced Selective Thermal Decomposition of Ultrathin SiO_2 Layers Used in Nanofabrication
n-Type Control by Sulfur Ion Implantation in Homoepitaxial Diamond Films Grown by Chemical Vapor Deposition
High-Quality B-Doped Homoepitaxial Diamond Films using Trimethylboron
Influence of Biased Electrode on Plasma Confinement in the Tohoku University Heliac
Particle Transport Study with an Electron Beam in the Tohoku University Heliac
Potential Structure Measurements of ECH Plasma in a Helical Axis Stellarator
Analysis of Leading Edge/Trailing Edge Independent Detection Method in Optical Disk : High Density Recording
Analysis of Leading Edge/Trailing Edge Independent Detection Method in Optical Disk
Preparation of Ferroelectric Thin Films of Bismuth Layer Structured Compounds
Depolarization Characteristics in Sol-Gel Ferroelectric Pb(Zr_Ti_)O_3 Thin-Film Capacitors
Characteristics of Bismuth Layered SrBi_2Ta_2O_9 Thin-Film Capacitors and Comparison with Pb(Zr, Ti)O_3
Origin of Depolarization in Sol-Gel Ferroelectric Pb(Zr_Ti_)O_3 Thin-Film Capacitors
Characteristic Change Due to Polarization Fatigue of Sol-Gel Ferroelectric Pb(Zr_Ti_)O_3 Thin-Film Capacitors ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
Polarization Fatigue Characteristics of Sol-Get Ferroelectric Pb(Zr_Ti_)O_3 Thin-Film Capacitors
Evaluation of Imprint Properties in Sol-Get Ferroelectric Pb(ZrTi)O_3 Thin-Film Capacitors
Analysis of the Thickness Edge Mode in Piezoelectric Plates and Its Application to Resonators
Structure of Trimer-Type Isocyanate Hardening Agents and Reactivity of Their Isocyanate Group
Estimation of Reactivity of Isocyanate Groups by Calculation and Magnetochemical Measurement
Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
Polymer-C_ Composite with Ferromagnetism
Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition
Layer-by-Layer Oxidation of Si(001) Surfaces
Precise Fabrication Technique of UHF SAW Al Electrodes and Leaky SAW Propagation Characteristics on 36°Y-X LiTaO_3 : SAW and Communication Devices
Precise Measurement of Leaky SAW Velocity on LiTaO_3-36° YX Substrates Using a Comb-Filter Method : SAW and Communication Devices
Frequency Spectrum of Fluctuations Near a Rational Surface in a Toroidal Heliac
A New Capacitive/Resistive Probe Method for Studying Magnetic Surfaces
Nanometer Pattern Transfer by VUV Lithography with a D_2 Lamp : Lithography Technology
Nanometer Pattern Transfer by VUV Lithography with a D_2 Lamp
Detection and Printability of Shifter Defects in Phase-Shifting Masks II. : Defocus Characteristics
Detection and Printability of Shifter Defects in Phase-Shifting Masks : Photolithography
Pattern Transfer Characteristics of Transparent Phase Shifting Mask : Photolithography
Detection and Printability of Shifter Defects in Phase-Shifting Masks
Pattern Transfer Characteristics of Transparent Phase Shifting Mask
Thermodynamics of Development Process of Positive Resists in Binary Mixed Developer : Resist Material and Process
A DUV-Defined-Negative Resist/EB-Defined-positive Resist Two-Layer Resist System for the Fabrication of T-Shaped Gate : Lithography Technology
A DUV-Defined-Negative Resist/EB-Defined-Positive Resist Two-Layer Resist System for the Fabrication of T-Shaped Gate
Thermodynamics of Development Process of Positive Resists in Binary Mixed Developer
Novel Process for Visible Light Emission from Si Prepared by Ion Irradiation
Properties of Photosensor with Amorphous Si:H/SiO_x:H Double-Layer Structure
Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System : Micro/nanofabrication and Devices
Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System
Properties of Silicon-Oxygen Alloy Films Prepared from SiH_4+CO_2 Gas Mixture
A New Type of Heterojunction a-Si Photodiode for Lensless Contact-Type Image Sensor

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