MATSUI Shinji | Fundamental Res. Labs., NEC Corporation

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概要

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著作論文

Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography
Calixarene Electron Beam Resist for Nano-Lithography
Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography
FIB Exposure Characteristics of LB Film
Fabrication and Magnetotransport of One-Dimensional Lateral Surface Superlattice Fabricated by Low-Energy Ion Irradiation
Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition
Measurement of Sidewall Roughness by Scanning Tunneling Microscope : Inspection and Testing
Measurement of Sidewall Roughness by Scanning Tunneling Microscope
Reverse Dry Etching Using a High-Selectivity Carbon Mask Formed by Electron Beam Deposition
GaAs Dry Etching Using Electron Beam Induced Surface Reaction
Cl Atom Desorption by Chemical Reaction with Al Atom on Si(111) 7 × 7 Studied by Scanning Tunneling Microscopy
Nanostructure Fabrication by Scanning Tunneling Microscope : Microfabrication and Physics
Nanostructure Fabrication by Scanning Tunneling Microscope
Superconducting Lines Fabricated from Epitaxial Y-Ba-Cu-O Films : High Temperature Superconducting Thin-Films(Solid State Devices and Materials 1)
YBa_2Cu_3O_y Superconducting Thin Film Obtained by Laser Annealing : Electrical Properties of Condensed Matter
Novel Process for Visible Light Emission from Si Prepared by Ion Irradiation
An Approach for Nanolithography Using Electron Holography
Proposal of Pseudo Source and Drain MOSFETs for Evaluating 10-nm Gate MOSFETs
Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System : Micro/nanofabrication and Devices
Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System
Bi-Level Structures for Focused Ion Beam Using Maskless Ion Etching
Nanolithography Using a Chemically Amplified Negative Resist by Electron Beam Exposure
Focused Ion Beam Lithography Using Novolak-Based Resist : Techniques, Instrumentations and Measurement
Fabrication of Y-Cu Liquid Metal Ion Sources : Techniques, Instrumentations and Measurement
Etching Characteristics for Organosilica
Low-Temperature Electron-Beam-Assisted Dry Etching for GaAs Using Electron-Stimulated Desorption
Electron Beam Irradiation Effects on Cl_2/GaAs
GaAs Dry Etching Using Electron Beam Induced Surface Reaction : Etching
New Selective Deposition Technology by Electron Beam Induced Surface Reaction

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