Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System : Micro/nanofabrication and Devices
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-04-30
著者
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Baba M
Institute For Solid State Physics University Of Tokyo
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Manaka Susumu
Fundamental Research Laboratories Nec Corporation
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Baba Masakazu
Fundamental Research Laboratories Nec Corporation
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Baba Masakazu
Ntt Information And Communication Systems Laboratories
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Watanabe Heiji
Fundamental Research Laboratories Nec Corporation
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