Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-12-30

著者

• Fujita J

  Crest-jst

• FUJITA Jun-ichi

  Fundamental Res. Labs., NEC Corporation

• OCHIAI Yukinori

  Fundamental Res. Labs., NEC Corporation

• MATSUI Shinji

  Fundamental Res. Labs., NEC Corporation

• WATANABE Hideyuki

  Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)

• WATANABE Heiji

  Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c

• ICHIKAWA Masakazu

  Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c

• Watanabe Hirohito

  Institute Of Material Science University Of Tsukuba

• Watanabe H

  Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)

• Watanabe H

  Semiconductor Leading Edge Technol. Inc. Yokohama Jpn

• Ishida M

  Sii Nanotechnology Inc.

• Ichikawa Masakazu

  Joint Research Center For Atom Technology

• Ichikawa Masakazu

  Joint Research Center For Atom Technology Angstrom Technology Partnership

• Ichikawa Masakazu

  Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp) C

• Ichikawa Mitsuru

  Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology

• WATANABE Hajime

  ULSI Laboratory, Mitsubishi Electric Corporation

• Manaka Susumu

  Fundamental Research Laboratories Nec Corporation

• IWASA Masayuki

  SII Nanotechnology Inc.

• Watanabe Hideo

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

• Watanabe Heiji

  Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp)

• Iwasa Masayuki

  Sii Nanotechnology Inc. Tokyo Jpn

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