High-Quality CVD/Thermal Stacked Gate Oxide Films with Hydrogen-Free CVD SiO_2 Formed in a SiCl_4-N_2O System

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-03-30

著者

• Kobayashi K

  Dep. Of Electronic Sci. And Engineering Kyoto Univ. Katsura Nishikyo Kyoto 615-8510 Japaninnovative

• KUROKAWA Hisayoshi

  Department of Electrical and Electronic Engineering, Ehime University

• WATANABE Hideyuki

  Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)

• OGATA Tamotsu

  ULSI Laboratory, Mitsubishi Electric Corporation

• KOBAYASHI Kiyoteru

  ULSI Laboratory, Mitsubishi Electric Corporation

• KUROKAWA Hiroshi

  Advanced Technology R&D Center, Mitsubishi Electric Corporation

• HIRAYAMA Makoto

  ULSI Laboratory, Mitsubishi Electric Corporation

• Kobayashi K

  Kobe Steel Ltd. Kobe Jpn

• Kamigaki K

  College Of Liberal Arts Toyama University

• Kinoshita K

  Ntt Basic Research Laboratories

• Ogata Toshihiro

  Department Of Electronic Engineering Faculty Of Science And Engineering Saga University

• Matsui Yasushi

  Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat

• Watanabe H

  Semiconductor Leading Edge Technol. Inc. Yokohama Jpn

• Kudoh Kazuhide

  Department Of Applied Physics Tokyo University Of Science

• Kunihiro Kazuaki

  Optoelectronics And High Frequency Device Research Laboratories Nec Corporation

• Kurokawa Hisayoshi

  Department Of Electrical And Electronic Engineering Ehime University

• Kitazawa Koichi

  Ntt Basic Research Laboratories

• Kurihara K

  Ntt Basic Research Laboratories

• Ogata T

  Ulsi Development Center Mitsubishi Electric Corp.

• WATANABE Hajime

  ULSI Laboratory, Mitsubishi Electric Corporation

• MATSUI Yasuji

  ULSI Laboratory, Mitsubishi Electric Corporation

• Kurokawa Hiroshi

  Advanced Technology R&d Center Mitsubishi Electric Corp

• Muto Y

  The Institute For Materials Research Tohoku University

• Kurokawa H

  Department Of Electrical And Electronic Engineering Ehime University

• Matsui Yasuji

  Ulsi Laboratory Mitsubishi Electric Corporation

• Hirayama M

  Ulsi Laboratory Mitsubishi Electric Corporation

• Hirayama Makoto

  Lsi R&d Lab. Mitsubishi Electric Corp.

• Hirayama Makoto

  Ulsi Laboratory Mitsubishi Electric Corporation

• Watanabe Hideo

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

• Watanabe Hajime

  Ulsi Laboratory Mitsubishi Electric Corporation

• Ogata Tamotsu

  ULSI Development Center, Mitsubishi Electric Corp.

• KOBAYASHI Kiyoteru

  ULSI Laboratory, Evaluation amp Analysis Center, Mitsubishi Electric Corporation

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