Highly Reliable SiO_2 Films Formed by UV-O_2 Oxidation

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-03-30

著者

• Kinoshita K

  Ntt Basic Research Laboratory

• Kobayashi K

  Dep. Of Electronic Sci. And Engineering Kyoto Univ. Katsura Nishikyo Kyoto 615-8510 Japaninnovative

• TERAMOTO Akinobu

  ULSI Development Center, Mitsubishi Electric Corporation

• Ohno Yoshikazu

  Ulsi Laboratory Mitsubishi Electric Corporation

• KOBAYASHI Kiyoteru

  ULSI Laboratory, Mitsubishi Electric Corporation

• HIRAYAMA Makoto

  ULSI Laboratory, Mitsubishi Electric Corporation

• Kobayashi K

  Kobe Steel Ltd. Kobe Jpn

• Kamigaki K

  College Of Liberal Arts Toyama University

• Kinoshita K

  Ntt Basic Research Laboratories

• Kudoh Kazuhide

  Department Of Applied Physics Tokyo University Of Science

• Teramoto Akinobu

  Ulsi Development Center Mitsubishi Electric Corporation

• Teramoto Akinobu

  Ulsi Laboratory Mitsubishi Electric Corporation

• Teramoto Akinobu

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

• Kunihiro Kazuaki

  Optoelectronics And High Frequency Device Research Laboratories Nec Corporation

• Kitazawa Koichi

  Ntt Basic Research Laboratories

• Kurihara K

  Ntt Basic Research Laboratories

• Kobayashi Keiji

  Toshiba Research And Development Center

• Hirayama M

  Ulsi Laboratory Mitsubishi Electric Corporation

• Hirayama Makoto

  Lsi R&d Lab. Mitsubishi Electric Corp.

• Hirayama Makoto

  Ulsi Laboratory Mitsubishi Electric Corporation

• KOBAYASHI Kiyoteru

  ULSI Laboratory, Evaluation amp Analysis Center, Mitsubishi Electric Corporation

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