Kinetic Study of Silicon Nitride Growth from Dichlorosilane and Ammonia

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1996-03-15

著者

• Kobayashi K

  Dep. Of Electronic Sci. And Engineering Kyoto Univ. Katsura Nishikyo Kyoto 615-8510 Japaninnovative

• Horie Kazuo

  Department Of Electronic System And Information Engineering Faculty Of Biology-oriented Science And

• KOBAYASHI Kiyoteru

  Mitsubishi Electric Corporation, ULSI Laboratory

• HIRAYAMA Makoto

  Mitsubishi Electric Corporation, ULSI Laboratory

• Kobayashi K

  Kobe Steel Ltd. Kobe Jpn

• Kamigaki K

  College Of Liberal Arts Toyama University

• Ogata Toshihiro

  Department Of Electronic Engineering Faculty Of Science And Engineering Saga University

• Matsui Yasushi

  Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat

• Kudoh Kazuhide

  Department Of Applied Physics Tokyo University Of Science

• Kunihiro Kazuaki

  Optoelectronics And High Frequency Device Research Laboratories Nec Corporation

• Kitazawa Koichi

  Ntt Basic Research Laboratories

• Kurihara K

  Ntt Basic Research Laboratories

• Ogata T

  Ulsi Development Center Mitsubishi Electric Corp.

• OGATA Tamotsu

  Mitsubishi Electric Corporation, ULSI Laboratory

• SORITA Tetsuji

  Mitsubishi Electric Corporation, Central Research Laboratory

• MATSUI Yasuji

  Mitsubishi Electric Corporation, ULSI Laboratory

• Muto Y

  The Institute For Materials Research Tohoku University

• Sorita Tetsuji

  Mitsubishi Electric Corporation Central Research Laboratory

• Hirayama M

  Ulsi Laboratory Mitsubishi Electric Corporation

• Hirayama Makoto

  Lsi R&d Lab. Mitsubishi Electric Corp.

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