Hydrogen Passivation of Polysilicon Thin-Film Tramsistors by Electron Cyclotron Resonance Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-06-15
著者
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Nunoshita M
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Kobayashi K
Dep. Of Electronic Sci. And Engineering Kyoto Univ. Katsura Nishikyo Kyoto 615-8510 Japaninnovative
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Nunoshita M
Mitsubishi Electric Corp. Hyogo Jpn
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Nunoshita Masahiro
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Nunoshita Masahiro
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Kobayashi K
Kobe Steel Ltd. Kobe Jpn
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BAERT Kris
Display and Electronic Devices Department, Materials and Electronic Devices Laboratory, Mitsubishi E
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MURAI Hiroyuki
Display and Electronic Devices Department, Materials and Electronic Devices Laboratory, Mitsubishi E
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KOBAYASHI Kazuhiro
Display and Electronic Devices Department, Materials and Electronic Devices Laboratory, Mitsubishi E
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NAMIZAKI Hirofumi
Display and Electronic Devices Department, Materials and Electronic Devices Laboratory, Mitsubishi E
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NUNOSHITA Masahiro
Display and Electronic Devices Department, Materials and Electronic Devices Laboratory, Mitsubishi E
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Kudoh Kazuhide
Department Of Applied Physics Tokyo University Of Science
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Kunihiro Kazuaki
Optoelectronics And High Frequency Device Research Laboratories Nec Corporation
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Kitazawa Koichi
Ntt Basic Research Laboratories
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Kurihara K
Ntt Basic Research Laboratories
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Baert Kris
Materials & Electronic Devices Laboratory Mitsubishi Electric Corporation : (present Address) In
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Murai Hiroyuki
Materials & Electronic Devices Laboratory Mitsubishi Electric Corporation
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Namizaki Hirofumi
Materials & Electronic Devices Laboratory Mitsubishi Electric Corporation
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