Dielectric Properties of (Ba,Sr)TiO_3 Thin Films Deposited by RF Sputtering

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-09-30

著者

• Nunoshita M

  Graduate School Of Materials Science Nara Institute Of Science And Technology

• Nunoshita M

  Mitsubishi Electric Corp. Hyogo Jpn

• Nunoshita Masahiro

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Nunoshita Masahiro

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

• TANIMURA Junji

  Materials and Electronic Devices Laboratory, Mitsubishi Electric Corporation

• HORIKAWA Tsuyoshi

  Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation

• MIKAMI Noboru

  Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation

• MAKITA Tetsuro

  Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation

• KATAOKA Masayuki

  Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation

• SATO Kazunao

  Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation

• NUNOSHITA Masahiro

  Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation

• Makita T

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

• Makita Tetsuro

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

• Mikami N

  Tohoku Univ. Sendai Jpn

• Kataoka M

  Hokkaido Univ. Sapporo Jpn

• Tanimura J

  Mitsubishi Electric Corp. Hyogo Jpn

• Tanimura Junji

  Materials And Electronic Devices Laboratory Mitsubishi Electric Corporation

• Sato K

  Ntt Network Innovation Laboratories

• Sato K

  Ykc Corp. Musashimurayama‐shi Jpn

• Mikami N

  Mitsubishi Electric Corp. Hyogo Jpn

• Horikawa Tsuyoshi

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Tanimura Junji

  Materials and Electronic Device Laboratory, Mitsubishi Electric Corporation

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