Mikami N | Mitsubishi Electric Corp. Hyogo Jpn
スポンサーリンク
概要
関連著者
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Makita T
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Makita Tetsuro
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Mikami N
Tohoku Univ. Sendai Jpn
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Mikami N
Mitsubishi Electric Corp. Hyogo Jpn
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Horikawa Tsuyoshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Mikami Noboru
Semiconductor Research Laboratory
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Horikawa Tsuyoshi
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Sato K
Ntt Network Innovation Laboratories
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Sato K
Ykc Corp. Musashimurayama‐shi Jpn
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Tanimura J
Mitsubishi Electric Corp. Hyogo Jpn
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Sato Kazunao
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Kuroiwa T
R&d Assoc. Future Electron Devices Tokyo Jpn
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Tanimura Junji
Materials And Electronic Devices Laboratory Mitsubishi Electric Corporation
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KUROIWA Takeharu
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Nunoshita M
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Nunoshita M
Mitsubishi Electric Corp. Hyogo Jpn
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Nunoshita Masahiro
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Nunoshita Masahiro
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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TANIMURA Junji
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corporation
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HORIKAWA Tsuyoshi
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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MIKAMI Noboru
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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MAKITA Tetsuro
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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KATAOKA Masayuki
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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SATO Kazunao
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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NUNOSHITA Masahiro
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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Kataoka M
Hokkaido Univ. Sapporo Jpn
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Ohno Y
Mitsubishi Electric Corp. Hyogo Jpn
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Ohno Yoshikazu
Ulsi Laboratory Mitsubishi Electric Corporation
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Ito Hiromi
ULSI Laboratory, Mitsubishi Electric Corporation
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TSUNEMINE Yoshikazu
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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TANIMURA Jyunji
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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Tsunemine Yoshikazu
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Ito Hiromi
Ulsi Laboratory Mitsubishi Electric Corporation
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Tanimura Junji
Materials and Electronic Device Laboratory, Mitsubishi Electric Corporation
著作論文
- Dielectric Properties of (Ba,Sr)TiO_3 Thin Films Deposited by RF Sputtering
- (Ba_<0.75>Sr_<0.25>)TiO_3 Films for 256 Mbit DRAM (Special Issue on Quarter Micron Si Device and Process Technologies)
- Dielectric Relaxation of (Ba, Sr)TiO_3 Thin Films
- Dielectric Properties of (Ba_xSr_)TiO_3 Thin Films Prepared by RF Sputtering for Dynamic Random Access Memory Application ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)