Kuroiwa T | R&d Assoc. Future Electron Devices Tokyo Jpn

スポンサーリンク

概要

• 同名の論文著者
• R&d Assoc. Future Electron Devices Tokyo Jpnの論文著者

関連著者

• Makita T

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

• Makita Tetsuro

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

• Mikami N

  Tohoku Univ. Sendai Jpn

• Mikami Noboru

  Semiconductor Research Laboratory

• Horikawa Tsuyoshi

  Semiconductor Research Laboratory, Mitsubishi Electric Corporation

• Kuroiwa T

  R&d Assoc. Future Electron Devices Tokyo Jpn

• KUROIWA Takeharu

  Semiconductor Research Laboratory, Mitsubishi Electric Corporation

• Mikami N

  Mitsubishi Electric Corp. Hyogo Jpn

• Horikawa Tsuyoshi

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Tanimura J

  Mitsubishi Electric Corp. Hyogo Jpn

• Sato Kazunao

  Semiconductor Research Laboratory, Mitsubishi Electric Corporation

• Tanimura Junji

  Materials And Electronic Devices Laboratory Mitsubishi Electric Corporation

• Sato K

  Ntt Network Innovation Laboratories

• TSUNEMINE Yoshikazu

  Semiconductor Research Laboratory, Mitsubishi Electric Corporation

• TANIMURA Jyunji

  Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation

• Tsunemine Yoshikazu

  Semiconductor Research Laboratory Mitsubishi Electric Corporation

• Sato K

  Ykc Corp. Musashimurayama‐shi Jpn

もっと見る 閉じる

著作論文

• Dielectric Relaxation of (Ba, Sr)TiO_3 Thin Films
• Dielectric Properties of (Ba_xSr_)TiO_3 Thin Films Prepared by RF Sputtering for Dynamic Random Access Memory Application ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)

スポンサーリンク