Thermal Desorption Spectroscopy of (Ba, Sr)TiO_3 Thin Films Prepared by Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 1996-02-01
著者
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斧 高一
京都大学大学院工学研究科
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Makita T
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Makita Tetsuro
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Univ. California Ca Usa
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KAWAHARA Takaaki
Semiconductor Leading Edge Technologies, Inc.
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YAMAMUKA Mikio
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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YUUKI Akimasa
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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ONO Kouichi
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Ono K
The Faculty Of Engineering Ehime University
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Yuuki A
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Yuuki Akimasa
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Yamamuka M
Mitsubishi Electric Corp. Hyogo Jpn
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Kawahara T
Semiconductor Leading Edge Technol. Inc. Tsukuba-shi Jpn
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Kawahara Takaaki
Semiconductor Leading Edge Technologies Inc.
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Ono Kouichi
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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KAWAHARA Takaaki
Semiconductor Leading Edge Technologies
関連論文
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- 1.はじめに(ドライエッチングの科学と技術の新局面)
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- 最近の展望 マイクロプラズマスラスター
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- Measurement of Atomic Incorporation Rates and Modeling of Surface Reactions in (Ba,Sr)TiO_3 Films Prepared by a Liquid Source Chemical Vapor Deposition
- Conformal Step Coverage of (Ba,Sr)TiO_3 Films Prepared by Liquid Source CVD Using Ti(t-BuO)_2(DPM)_2
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- Effects of Post-Annealing on Dielectric Properties of (Ba, Sr)TiO_3 Thin Films Prepared by Liquid Source Chemical Vapor Deposition(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)
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