Plasma Chemical View of Magnetron and Reactive Ion Etching of Si with Cl_2
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-10-20
著者
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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Ono K
Univ. California Ca Usa
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Ono K
Univ. Tsukuba Ibaraki Jpn
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ONO Kouichi
Central Research Laboratory, Mitsubishi Electric Corporation
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OOMORI Tatsuo
Central Research Laboratory, Mitsubishi Electric Corporation
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HANAZAKI Minoru
Central Research Laboratory, Mitsubishi Electric Corporation
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Oomori T
Mitsubishi Electric Corp. Hyogo Jpn
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Hanazaki M
Mitsubishi Electric Corp. Hyogo Jpn
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