An Atomic Scale Model of Multilayer Surface Reactions and the Feature Profile Evolution during Plasma Etching
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-12-30
著者
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斧 高一
京大 大学院工学研究科
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ONO Katsuji
Fujitsu Laboratories Ltd.
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Ono K
Univ. California Ca Usa
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Ono Kouichi
Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University
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OSANO Yugo
Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University
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Osano Yugo
Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University
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Ono K
The Faculty Of Engineering Ehime University
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