Multicusp Electron-Cyclotron-Resonance Plasma Source Working with Microwaves Radially Injected through an Annular Slit
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-03-15
著者
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西川 恵子
千葉大学大学院融合科学研究科
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西川 恵子
千葉大
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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Ono K
Univ. California Ca Usa
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Ono K
Univ. Tsukuba Ibaraki Jpn
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ONO Kouichi
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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TUDA Mutumi
Ad Advanced Technology R〓D Center, Mitsubishi Electric Corporation
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TUDA Mutumi
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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NAMBA Keisuke
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Taki Masakazu
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Taki Masakazu
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Namba K
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Tuda M
Mitsubishi Electric Corp. Hyogo Jpn
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Tuda Mutumi
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Tsuda M
Faculty Of Pharmaceutical Sciences Chiba University
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Taki Masakazu
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Ono Kouichi
Semiconductor Research Laboratory Mitsubishi Electric Corporation
関連論文
- 2.ドライエッチングのモデルとその実験検証(ドライエッチングの科学と技術の新局面)
- イオン液体はなぜ結晶化しにくいのか--相転移を司る超低速ダイナミクスに迫る (摩訶不思議な第3の液体 特集 イオン液体--液体としての地位と役割)
- イオン液体研究の到達点と課題そして展望 (摩訶不思議な第3の液体 特集 イオン液体--液体としての地位と役割)
- 熱物性からみたイオン液体 : 特異な凝固・融解過程
- 小角X線散乱によるポリマーブレンド繊維の炭素化過程における細孔形成と構造評価
- 熱物性からみたイオン液体 (特集:いま注目のイオン液体)
- 極限条件下 特殊条件下の液体や溶液のゆらぎ (小角散乱特集)
- 国立大学等の法人化に伴う労働安全衛生法問題について
- Development of an Apparatus for High-Resolution Measurement of Permittivity of Fluids near the Critical Point and Detection of the Critical Anomaly for Supercritical Ethylene
- ゆらぎから見た超臨界流体 (超臨界最新技術特集第5号)
- ゆらぎと小角散乱
- Evaluation and Countermeasures of Convective Heat Transfer on Thermal Conductivity Measurement Using the Peltier Effect and Application to Supercritical CO_2
- 24pYA-6 ゆらぎからみた超臨界流体の構造
- 小角X線散乱による超臨界流体のゆらぎ構造の研究
- Development of Thermal Conductivity Measurement for Fluids Which is Convenient and Effective for Samples near the Critical Point
- Structure Change of Glass-like Carbon with Heat Treatment, Studied by Small Angle X-Ray Scattering : I. Glass-like Carbon Prepared from Phenolic Resin
- ガラス状炭素の小角X線散乱と黒鉛化挙動
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- 回折法による超臨界流体のクラスタリングの研究 (マイクロクラスタ-科学の新展開) -- (液体の局所構造としてのクラスタ-)
- 4.高誘電率(High-k)材料のドライエッチング(ドライエッチングの科学と技術の新局面)
- 新しい液体『イオン液体』の科学
- 化学基礎講座 液体の構造を探る
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- Substrate Temperature Dependence of Carbon Incorporation into GaAs Grown by MBE Using Triethylgallium and As_4
- Highly Uniform, High-Purity GaAs Epitaxial Layer Grown by MBE Using Triethylgallium and Arsenic : Semiconductors and Semiconductor Devices
- 1.はじめに(ドライエッチングの科学と技術の新局面)
- 8.おわりに(ドライエッチングの科学と技術の新局面)
- 最近の展望 マイクロプラズマスラスター
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- 先端プラズマエッチングプロセスのモデリングと体系化
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- X-Ray Photoelectron Spectroscopy Study of Hetero-Interface between Manganese Pnictide and Mn-Zn Ferrite
- Epitaxial Growth of InAs on Single-Crystalline Mn-Zn Ferrite Substrates
- Thermal Desorption Spectroscopy of (Ba, Sr)TiO_3 Thin Films Prepared by Chemical Vapor Deposition
- Preparation of (Ba, Sr)TiO_3 Thin Films by Chemical Vapor Deposition Using Liquid Sources
- Step Coverage and Electrical Properties of (Ba, Sr)TiO_3 Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM)_2 ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Effect of Impurity at SiO_2/Si Interface on 2D Hole Gas
- Generalized Grazing Incidence-Angle X-Ray Diffraction Studies on InAs Quantum Dots on Si(100) Substrates
- The Effect of Surface Cleaning by Wet Treatments and Ultra High Vacuum Annealing for Ohmic Contact Formation of P-Type GaN
- Spin State Analysis of Epitaxial Mn Compound Films Using High Resolution X-Ray Fluorescence
- Chemical States of Piled-up Phosphorus and Arsenic Atoms at the SiO2/Si Interface (Proceedings of the Second International Conference on SRMS(Synchrotron Radiation in Materials Science)(2))
- Simulation of 2-Dimensional Hole Gas for PMOS Devices with Phosphorus Pile-Up
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- 「ゆらぎの構造化学」確立をめざして : 「乱れ」の定量化実験と格闘
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- Multicusp Electron-Cyclotron-Resonance Plasma Source Working with Microwaves Radially Injected through an Annular Slit
- Measurement of the Cl Atom Concentration in RF Chlorine Plasmas by Two-Photon Laser-Induced Fluorescence
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- Plasma Chemical View of Magnetron and Reactive Ion Etching of Si with Cl_2
- Scanning Tunneling Microscopy and Atomic Force Microscopy Study on Interface between Molecular-Beam-Grown Pt Film and Si (111) Substrate
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- Simulation of Ion Trajectories near Submicron-Patterned Surface Including Effects of Local Charging and Ion Drift Velocity toward Wafer ( Plasma Processing)
- Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance Plasmas
- Conformal Step Coverage of (Ba,Sr)TiO_3 Films Prepared by Liquid Source CVD Using Ti(t-BuO)_2(DPM)_2
- Conformal Step Coverage of (Ba,Sr)TiO_3 Films Prepared by Liquid Source CVD Using Ti(t-BuO)_2(DPM)_2
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- Mechanisms of X-Ray Radiation-Induced Damage in (Ba, Sr)TiO_3 Capacitors
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- Mechanisms of Synchrotron X-Ray Irradiation-Induced Damage in (Ba, Sr)TiO_3 Capacitors
- A Mass Spectrometric Study of Reaction Mechanisms in Chemical Vapor Deposition of (Ba, Sr)TiO_3 Films
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- 小角X線散乱による多孔質炭素材料の細孔構造の研究
- イミダゾリウム系イオン液体の相転移挙動 (小特集 イオン液体(1)総論ならびに基礎物性研究の動向)
- Gate Voltage Dependence of the Resistance of a Two-Dimensional Array of Small Tunnel Junctions ( Quantum Dot Structures)
- Chemical Potential Dependence of Resistance of Two-Dimensional Array of Small Tunnel Junctions
- イミダゾリウム系イオン液体の相転移挙動
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- 古典的分子動力学計算による物理的プラズマダメージ形成機構の検討 : Fin型MOSFETでの欠陥生成機構(プロセス科学と新プロセス技術)
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