Tsuda M | Faculty Of Pharmaceutical Sciences Chiba University

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概要

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著作論文

A Highly-Sensitive Dry Developable Resist
High-Remaining Dry-Developed Resist Patterns of Steep Profile
In Situ Fourier Transform Infrared Measurements of Si Surface and Bulk Plasmas in Cl_2/O_2 and HBr/O_2 Electron Cyclotron Resonance Plasma Etching: Influence of Oxygen on Reaction Products
In situ Monitoring of Product Species in Plasma Etching by Fourier Transform Infrared Absorption Spectroscopy
Anisotropic Etching of n^+-Polysilicon Using Beam Plasmas Generated by Gas Puff Plasma Sources
Chemical Kinetics of Chlorine in Electron Cyclotron Resonance Plasma Etching of Si ( Plasma Processing)
Multicusp Electron-Cyclotron-Resonance Plasma Source Working with Microwaves Radially Injected through an Annular Slit
Measurement of the Cl Atom Concentration in RF Chlorine Plasmas by Two-Photon Laser-Induced Fluorescence
Etching for 0.15-μm-Level Patterns with Low Microloading Effect Using Beam Plasmas Generated by Gas Puff Plasma Sources
Simulation of Ion Trajectories near Submicron-Patterned Surface Including Effects of Local Charging and Ion Drift Velocity toward Wafer ( Plasma Processing)
Theoretical Analysis of Charge Confinement in Metal Microclusters
Formation of Al Clusters Grown on the Hydrogenated Diamind Surfaces
Al Adatom Migration on the Partly H-Terminated Si (111) Surface
Proposal of a Micro-Fabrication Process for Al Nanostructures ( Quantum Dot Structures)
Epitaxial Growth Mechanism of the (100) As Surface of GaAs : The Effect of Positive Holes : Condensed Matter
On the Reaction Mechanism of the Pyrolyses of TMG and TEG in MOCVD Growth Reactors
Large Amplitude Shock Waves Having Negative Potential Well in a Plasma with Negative Ions
On Large Amplitude Ion Acoustic Solitons in Plasma with Negative Ions

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