NAMBA Keisuke | Semiconductor Research Laboratory, Mitsubishi Electric Corporation
スポンサーリンク
概要
関連著者
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西川 恵子
千葉大学大学院融合科学研究科
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西川 恵子
千葉大
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NAMBA Keisuke
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Namba K
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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TUDA Mutumi
Ad Advanced Technology R〓D Center, Mitsubishi Electric Corporation
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TUDA Mutumi
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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OOMORI Tatsuo
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Tuda M
Mitsubishi Electric Corp. Hyogo Jpn
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Tuda Mutumi
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Oomori T
Mitsubishi Electric Corp. Hyogo Jpn
著作論文
- In situ Monitoring of Product Species in Plasma Etching by Fourier Transform Infrared Absorption Spectroscopy
- Chemical Kinetics of Chlorine in Electron Cyclotron Resonance Plasma Etching of Si ( Plasma Processing)
- Multicusp Electron-Cyclotron-Resonance Plasma Source Working with Microwaves Radially Injected through an Annular Slit
- Simulation of Ion Trajectories near Submicron-Patterned Surface Including Effects of Local Charging and Ion Drift Velocity toward Wafer ( Plasma Processing)
- Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance Plasmas