Ootera H | Mitsubishi Electric Corp. Hyogo Jpn
スポンサーリンク
概要
関連著者
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西川 恵子
千葉大学大学院融合科学研究科
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西川 恵子
千葉大
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TUDA Mutumi
Ad Advanced Technology R〓D Center, Mitsubishi Electric Corporation
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Ootera H
Mitsubishi Electric Corp. Hyogo Jpn
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Tuda M
Mitsubishi Electric Corp. Hyogo Jpn
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Oomori T
Mitsubishi Electric Corp. Hyogo Jpn
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Tsuda M
Faculty Of Pharmaceutical Sciences Chiba University
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OOMORI Tatsuo
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Ootera Hiroki
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Taki Masakazu
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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Ono K
Univ. California Ca Usa
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Ono K
Univ. Tsukuba Ibaraki Jpn
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NISHIKAWA Kazuyasu
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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OOMORI Tatsuo
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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ONO Kouichi
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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NISHIKAWA Kazuyasu
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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TUDA Mutumi
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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NAMBA Keisuke
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Taki Masakazu
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Ootera Hiroki
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Namba K
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Tuda Mutumi
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Taki Masakazu
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Oomori Tatsuo
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Ono Kouichi
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Nishikawa Kazuyasu
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki, Hyogo 661-8661, Japan
著作論文
- Anisotropic Etching of n^+-Polysilicon Using Beam Plasmas Generated by Gas Puff Plasma Sources
- Etching for 0.15-μm-Level Patterns with Low Microloading Effect Using Beam Plasmas Generated by Gas Puff Plasma Sources
- Simulation of Ion Trajectories near Submicron-Patterned Surface Including Effects of Local Charging and Ion Drift Velocity toward Wafer ( Plasma Processing)