A Highly-Sensitive Dry Developable Resist

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Substrate Deacylation Mechanism of Serine beta-lactamases
A Highly-Sensitive Dry Developable Resist
High-Remaining Dry-Developed Resist Patterns of Steep Profile
Thickness Dependence of Giant Magnetoresistance in Granular Materials
Magnetic and Magnetoresistive Modification on Granular Co-Ag Films by Soft Magnetic Permalloy Layer
Kerr Rotation of Quenched High-Temperature-Phase MnBi Film
In Situ Fourier Transform Infrared Measurements of Si Surface and Bulk Plasmas in Cl_2/O_2 and HBr/O_2 Electron Cyclotron Resonance Plasma Etching: Influence of Oxygen on Reaction Products
In situ Monitoring of Product Species in Plasma Etching by Fourier Transform Infrared Absorption Spectroscopy
Anisotropic Etching of n^+-Polysilicon Using Beam Plasmas Generated by Gas Puff Plasma Sources
Chemical Kinetics of Chlorine in Electron Cyclotron Resonance Plasma Etching of Si ( Plasma Processing)
Multicusp Electron-Cyclotron-Resonance Plasma Source Working with Microwaves Radially Injected through an Annular Slit
Measurement of the Cl Atom Concentration in RF Chlorine Plasmas by Two-Photon Laser-Induced Fluorescence
Analysis of Light-Induced Degradation in Amorphous Silicon Alloy Solar Cells and Its Application to Accelerated Test Method
Etching for 0.15-μm-Level Patterns with Low Microloading Effect Using Beam Plasmas Generated by Gas Puff Plasma Sources
Simulation of Ion Trajectories near Submicron-Patterned Surface Including Effects of Local Charging and Ion Drift Velocity toward Wafer ( Plasma Processing)
Origin of the Primary Kinetic Hydrogen Isotope Effects on N-dealkylation from N-alkylamine by Hemoproteins
Catalytic Mechanism of Class A β-Lactamase. I. The Role of Glu166 and Ser130 in the Deacylation Reaction
Theoretical Analysis of Charge Confinement in Metal Microclusters
Formation of Al Clusters Grown on the Hydrogenated Diamind Surfaces
Al Adatom Migration on the Partly H-Terminated Si (111) Surface
Proposal of a Micro-Fabrication Process for Al Nanostructures ( Quantum Dot Structures)
Epitaxial Growth Mechanism of the (100) As Surface of GaAs : The Effect of Positive Holes : Condensed Matter
On the Reaction Mechanism of the Pyrolyses of TMG and TEG in MOCVD Growth Reactors
Large Amplitude Shock Waves Having Negative Potential Well in a Plasma with Negative Ions
On Large Amplitude Ion Acoustic Solitons in Plasma with Negative Ions
Effect of Channel Implantation on the Device Performance of Low Temperature Processed Polycrystalline Silicon Thin Film Transistors
Frequency Dependence of Resistivity of High-Purity Copper at Low Temperatures
The Importance of the Positively Charged Surface for the Epitaxial Growth of Diamonds at Low Pressure

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