In Situ Fourier Transform Infrared Measurements of Si Surface and Bulk Plasmas in Cl_2/O_2 and HBr/O_2 Electron Cyclotron Resonance Plasma Etching: Influence of Oxygen on Reaction Products
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-04-30
著者
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西川 恵子
千葉大学大学院融合科学研究科
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斧 高一
京都大学大学院工学研究科
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西川 恵子
千葉大
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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Ono K
Univ. California Ca Usa
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Ono K
Univ. Tsukuba Ibaraki Jpn
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NISHIKAWA Kazuyasu
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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OOMORI Tatsuo
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Ono Kouichi
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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TUDA Mutumi
Ad Advanced Technology R〓D Center, Mitsubishi Electric Corporation
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Ono K
The Faculty Of Engineering Ehime University
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Tuda M
Mitsubishi Electric Corp. Hyogo Jpn
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Oomori T
Mitsubishi Electric Corp. Hyogo Jpn
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Tsuda M
Faculty Of Pharmaceutical Sciences Chiba University
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Oomori Tatsuo
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Ono Kouichi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Nishikawa Kazuyasu
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki, Hyogo 661-8661, Japan
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