Effect of Impurity at SiO_2/Si Interface on 2D Hole Gas
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-07-30
著者
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斧 高一
京都大学大学院工学研究科
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Ono K
Univ. Tokyo Tokyo Jpn
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Ono Kanta
Department Of Engineering The University Of Tokyo
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ONO Katsuji
Fujitsu Laboratories Ltd.
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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Ono K
Univ. California Ca Usa
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OSHIMA Masaharu
Department of Engineering, University of Tokyo
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Oshima M
Department Of Applied Chemistry The University Of Tokyo
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FUJIOKA Hiroshi
Department of Applied Chemistry, The University of Tokyo
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NOMA Hirokazu
Department of Applied Chemistry, University of Tokyo
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Noma Hirokazu
Department Of Applied Chemistry University Of Tokyo
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Ono K
The Faculty Of Engineering Ehime University
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Fujioka H
Univ. Tokyo Tokyo Jpn
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Fujioka Hiroshi
大日本製薬
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Ono Kanta
Department Of Applied Chemistry The University Of Tokyo
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Oshima Masaharu
Department Of Applied Chemistry Graduate School Of Engineering The University Of Tokyo
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Fujioka Hiroshi
Department Of Applied Chemistry The University Of Tokyo
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OSHIMA Masaharu
Department of Applied Chemistry and JST-CREST, The University of Tokyo
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