Chemical States of Piled-up Phosphorus and Arsenic Atoms at the SiO2/Si Interface (Proceedings of the Second International Conference on SRMS(Synchrotron Radiation in Materials Science)(2))
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
著者
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斧 高一
京都大学大学院工学研究科
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Ono K
Univ. Tokyo Tokyo Jpn
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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Ono K
Univ. California Ca Usa
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FUJIOKA Hiroshi
Department of Applied Chemistry, The University of Tokyo
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Ono K
The Faculty Of Engineering Ehime University
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Fujioka H
Univ. Tokyo Tokyo Jpn
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Fujioka Hiroshi
大日本製薬
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