Quantitative Characterization of Plasma-Induced Defect Generation Process in Exposed Thin Si Surface Layers

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概要

• 論文の詳細を見る
• 2007-09-19

著者

• Ono Kouichi

  Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University

• Eriguchi Koji

  Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University

• Hamada Daisuke

  Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University

• ERIGUCHI Koji

  Graduate School of Engineering, Kyoto University

• OHNO Akira

  Graduate School of Engineering, Kyoto University

• HAMADA Daisuke

  Graduate School of Engineering, Kyoto University

• KAMEI Masayuki

  Graduate School of Engineering, Kyoto University

• FUKUMOTO Hiroshi

  Graduate School of Engineering, Kyoto University

• ONO Kouichi

  Graduate School of Engineering, Kyoto University

• Kamei Masayuki

  Graduate School Of Engineering Kyoto University

• Fukumoto Hiroshi

  Graduate School Of Engineering Kyoto University

• Ohno Akira

  Graduate School Of Engineering Kyoto University

• Hamada Daisuke

  Graduate School of Engineering, Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-8501, Japan

• Eriguchi Koji

  Graduate School of Engineering Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-8501, Japan

• Ono Kouichi

  Graduate School of Engineering Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-8501, Japan

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