Selective Etching of High-k Dielectric HfO_2 Films over Si in BCl_3-Containing Plasmas without rf Biasing

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2009-01-25

著者

• NAKAMURA Keisuke

  Department of Applied Quantum Physics and Nuclear Engineering, Kyushu University

• Ono Kouichi

  Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University

• Eriguchi Koji

  Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University

• UEDA Yoshinori

  Department of Electronics and Electrical Engineering, Keio University

• HAMADA Daisuke

  Department of Orthopedics, Institute of Health Biosciences, The University of Tokushima

• Hamada Daisuke

  Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University

• Ueda Yoshinori

  Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University

• Ono Kouichi

  Department Of Aeronautical Engineering Faculty Of Engineering Kyoto University

• Nakamura Keisuke

  Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University

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