Ono Kouichi | Department Of Aeronautical Engineering Faculty Of Engineering Kyoto University

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概要

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著作論文

Numerical Analysis of the Electromagnetic Fields in a Microwave Plasma Source Excited by Azimuthally Symmetric Surface Waves
Arg124Cys Mutation of the βig-h3 Gene in a Japanese Family With Lattice Corneal Dystrophy Type I
Selective Etching of High-k Dielectric HfO_2 Films over Si in BCl_3-Containing Plasmas without rf Biasing
Molecular Dynamics Analysis of the Formation of Surface Roughness during Si Etching in Chlorine-Based Plasmas
Three-Dimensional Atomic-Scale Cellular Model and Feature Profile Evolution during Si Etching in Chlorine-Based Plasmas: Analysis of Profile Anomalies and Surface Roughness
Particle Simulations of Sheath Dynamics in Low-Pressure Capacitively Coupled Argon Plasma Discharges
Atomic-Scale Cellular Model and Profile Simulation of Si Etching: Analysis of Profile Anomalies and Microscopic Uniformity
The Applicability of Formal Specification to Maintenance of Large-Scale Software
Molecular Dynamics Evaluation of Thermal Transport in Naked and Oxide-Coated Silicon Nanowires
Plasma Formation in a Neutral Gas by a Short-Pulsed, High-Current Electron Beam
Beam and Plasma Currents in an Injection of a Short-Pulsed, High-Current Electron Beam into Initially-Neutral Gases
Visible and Ultraviolet High-Intensity Spectral Lines in Electron-Beam-Produced Plasmas
Etching of High-k Dielectric HfO2 Films in BCl3-Containing Plasmas Enhanced with O2 Addition
Numerical Investigation on Origin of Microscopic Surface Roughness during Si Etching by Chemically Reactive Plasmas
Numerical Study on Si Etching by Monatomic Br+/Cl+ Beams and Diatomic Br2+/Cl2+/HBr+ Beams
Molecular Dynamics Simulation of Si Etching by Off-Normal Cl+ Bombardment at High Neutral-to-Ion Flux Ratios
Molecular-Dynamics-Based Profile Evolution Simulation for Sub-10-nm Si Processing Technology
UV〜Near-IR Laser Lines in Electron-Beam-Produced Rare Gas Plasmas
Effects of Mask Pattern Geometry on Plasma Etching Profiles
Laser Action of Ionized and Neutral Atomic Lines in Electron-Beam-Produced Rare Gas Plasmas
On Early-Stage-Excitation Processes of KrII and XeII Lines in Pulsed-Electron-Beam Produced Plasmas
A Model Analysis of Feature Profile Evolution and Microscopic Uniformity during Polysilicon Gate Etching in Cl2/O2 Plasmas
An Atomic Scale Model of Multilayer Surface Reactions and the Feature Profile Evolution during Plasma Etching
Modeling and Simulation of Nanoscale Surface Rippling during Plasma Etching of Si under Oblique Ion Incidence
Plasma Diagnostics and Thrust Performance Analysis of a Microwave-Excited Microplasma Thruster
An Improvement of Stillinger–Weber Interatomic Potential Model for Reactive Ion Etching Simulations
Microwave-Excited High-Density Plasma Column Sustained along Metal Rod at Negative Voltage

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