Eriguchi Koji | Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University

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概要

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著作論文

A Comparative Study of Plasma Source-Dependent Charging Polarity in MOSFETs with High-k and SiO_2 Gate Dielectrics
Quantitative Characterization of Plasma-Induced Defect Generation Process in Exposed Thin Si Surface Layers
Plasma Diagnostics and Thrust Performance Analysis of a Microwave-Excited Microplasma Thruster
A Model Analysis of Feature Profile Evolution and Microscopic Uniformity during Polysilicon Gate Etching in Cl_2/O_2 Plasmas
Molecular-Dynamics-Based Profile Evolution Simulation for Sub-10-nm Si Processing Technology
Selective Etching of High-k Dielectric HfO_2 Films over Si in BCl_3-Containing Plasmas without rf Biasing
Molecular Dynamics Analysis of the Formation of Surface Roughness during Si Etching in Chlorine-Based Plasmas
Three-Dimensional Atomic-Scale Cellular Model and Feature Profile Evolution during Si Etching in Chlorine-Based Plasmas: Analysis of Profile Anomalies and Surface Roughness
Particle Simulations of Sheath Dynamics in Low-Pressure Capacitively Coupled Argon Plasma Discharges
Atomic-Scale Cellular Model and Profile Simulation of Si Etching: Analysis of Profile Anomalies and Microscopic Uniformity
Molecular Dynamics Evaluation of Thermal Transport in Naked and Oxide-Coated Silicon Nanowires
Numerical Investigation on Origin of Microscopic Surface Roughness during Si Etching by Chemically Reactive Plasmas
Numerical Study on Si Etching by Monatomic Br+/Cl+ Beams and Diatomic Br2+/Cl2+/HBr+ Beams
Molecular Dynamics Simulation of Si Etching by Off-Normal Cl+ Bombardment at High Neutral-to-Ion Flux Ratios
Molecular-Dynamics-Based Profile Evolution Simulation for Sub-10-nm Si Processing Technology
Effects of Mask Pattern Geometry on Plasma Etching Profiles
A Model Analysis of Feature Profile Evolution and Microscopic Uniformity during Polysilicon Gate Etching in Cl2/O2 Plasmas
Modeling and Simulation of Nanoscale Surface Rippling during Plasma Etching of Si under Oblique Ion Incidence
Plasma Diagnostics and Thrust Performance Analysis of a Microwave-Excited Microplasma Thruster
An Improvement of Stillinger–Weber Interatomic Potential Model for Reactive Ion Etching Simulations

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