Numerical Investigation on Origin of Microscopic Surface Roughness during Si Etching by Chemically Reactive Plasmas
スポンサーリンク
概要
- 論文の詳細を見る
A key factor for the formation of nanoscale surface roughness during chemically reactive plasma and beam etchings has been distinguished by classical molecular dynamics (MD) simulations using well-known Stillinger–Weber potential models. In this study, MD simulations of Si(100) etching using monoenergetic ($=100$ eV) Cl+ and Br+ beams were performed. On the basis of analyses of surface structures and ion trajectories, it was concluded that the penetration of impinging species into the Si surface and residual halogens inside the Si lattice is a crucial factor for enhancing the surface roughness. The accurate estimation of potential energies for the penetration into interstitial sites is essential for further qualitative improvement of etching simulations.
- 2008-08-25
著者
-
Eriguchi Koji
Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University
-
Ono Kouichi
Department Of Aeronautical Engineering Faculty Of Engineering Kyoto University
-
Ohta Hiroaki
Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-8501, Japan
-
Iwakawa Akira
Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-8501, Japan
関連論文
- Risk factors associated with preterm delivery in women with pregestational diabetes
- Numerical Analysis of the Electromagnetic Fields in a Microwave Plasma Source Excited by Azimuthally Symmetric Surface Waves
- Effects of KRN633, an Inhibitor of Vascular Endothelial Growth Factor Receptor-2 Tyrosine Kinase, on Vascular Development of Placenta and Fetus of Mid Pregnancy in Mice
- Effect of Estriol on Bone Loss in Postmenopausal Japanese Women : A Multicenter Prospective Open Study
- Absolute height reduction and percent height ratio of the vertebral body in incident fracture in Japanese women
- Long-term effects on bone mineral density and bone metabolism of 6 months' treatment with gonadotropin-releasing hormone analogues in Japanese women : comparison of buserelin acetate with leuprolide acetate
- Vaginal Symptoms in Japanese Postmenopausal Women : These Characteristics and the Effects of Hormone Replacement Therapy
- Effects of Counseling on Climacteric Symptoms in Japanese Postmenopausal Women
- Guidelines on the use of biochemical markers of bone turnover in osteoporosis (2001)
- Efficacy and tolerability of once-weekly administration of 17.5mg risedronate in Japanese patients with involutional osteoporosis : a comparison with 2.5-mg once-daily dosage regimen
- Arg124Cys Mutation of the βig-h3 Gene in a Japanese Family With Lattice Corneal Dystrophy Type I
- P-IS-70 Recurrent Hyperreactio Luteinalis in Spontaneous Singleton Pregnancy(Perinatology 1,Group 106,International Session)
- Performance of Straight-Through-Type Labyrinth for a Low-Pressure Axial Flow Fan with Outer Ring
- Validation of the Japanese Osteoporosis Quality of Life Questionnaire
- The impact of lifestyle factors on serum 25-hydroxyvitamin D levels : a cross-sectional study in Japanese women aged 19-25 years
- A Comparative Study of Plasma Source-Dependent Charging Polarity in MOSFETs with High-k and SiO_2 Gate Dielectrics
- Quantitative Characterization of Plasma-Induced Defect Generation Process in Exposed Thin Si Surface Layers
- Impact of dietary intake, education, and physical activity on bone mineral density among North Indian women
- Effect of physical activity and nutrition on bone mineral density in young Japanese women
- Bisphosphonate-related osteonecrosis of the jaw : position paper from the Allied Task Force Committee of Japanese Society for Bone and Mineral Research, Japan Osteoporosis Society, Japanese Society of Periodontology, Japanese Society for Oral and Maxillof
- Stillborn baby with partial monosomy of the short arm of chromosome 5 and partial trisomy of the short arm of chromosome 20
- Characteristics of Vortex Chamber Oscillation Device
- Enzyme Histochemical Studies on Alkaline Phosphatase in Endometrial Glandular Cell and Endometrial Cancer
- HEAT-STABLE ALKALINE PHOSPHATASE IN THE NORMAL FEMALE GENITAL ORGAN : WITH SPECIAL REFERENCE TO THE HISTOCHEMICAL HEAT-STABILITY TEST AND L-PHENYLALANINE INHIBITION TEST
- Age-related distribution of bone and skeletal parameters in 1,322 Japanese young women
- Influence of maternal genetic and lifestyle factors on bone mineral density in adolescent daughters : a cohort study in 387 Japanese daughter-mother pairs
- Association between lumber bone mineral density and vascular stiffness as assessed by pulse wave velocity in postmenopausal women
- Possible risk factor for postmenopausal women : Postprandial hypertriglyceridemia
- Plasma Diagnostics and Thrust Performance Analysis of a Microwave-Excited Microplasma Thruster
- A Model Analysis of Feature Profile Evolution and Microscopic Uniformity during Polysilicon Gate Etching in Cl_2/O_2 Plasmas
- Molecular-Dynamics-Based Profile Evolution Simulation for Sub-10-nm Si Processing Technology
- Selective Etching of High-k Dielectric HfO_2 Films over Si in BCl_3-Containing Plasmas without rf Biasing
- Alpha Fetoprotein Producing Early Gastric Cancer with Metachronous Liver Metastasis : A Report of Two Cases
- T cell activation in abnormal perinatal events
- Characterization of the sugar chain expression of normal term human placental villi using lectin histochemistry combined with immunohistochemistry
- Molecular Dynamics Analysis of the Formation of Surface Roughness during Si Etching in Chlorine-Based Plasmas
- Three-Dimensional Atomic-Scale Cellular Model and Feature Profile Evolution during Si Etching in Chlorine-Based Plasmas: Analysis of Profile Anomalies and Surface Roughness
- Particle Simulations of Sheath Dynamics in Low-Pressure Capacitively Coupled Argon Plasma Discharges
- Effect of Impeller Outlet Angle on Performance and Internal Flow of Centrifugal Pump for High-Viscosity Liquids
- Effects of KRN633, an Inhibitor of Vascular Endothelial Growth Factor Receptor-2 Tyrosine Kinase, on Vascular Development of Placenta and Fetus of Mid Pregnancy in Mice
- Atomic-Scale Cellular Model and Profile Simulation of Si Etching: Analysis of Profile Anomalies and Microscopic Uniformity
- Diagnosis of toxic shock syndrome by two different systems : clinical criteria and monitoring of TSST-1-reactive T cells
- Familial correlation of bone mineral density, birth data and lifestyle factors among adolescent daughters, mothers and grandmothers
- The Applicability of Formal Specification to Maintenance of Large-Scale Software
- Molecular Dynamics Evaluation of Thermal Transport in Naked and Oxide-Coated Silicon Nanowires
- The Relationship between shape and Energy Loss of Rectangular Duct Branches Suitable for Production Rationalization
- Clinical features of fetal growth restriction complicated later by preeclampsia
- Design of a pragmatic approach to evaluate the effectiveness of concurrent treatment for the prevention of osteoporotic fractures
- Dr. Soju Kurihara : increased awareness of cytologic diagnosis
- Plasma Formation in a Neutral Gas by a Short-Pulsed, High-Current Electron Beam
- Beam and Plasma Currents in an Injection of a Short-Pulsed, High-Current Electron Beam into Initially-Neutral Gases
- Visible and Ultraviolet High-Intensity Spectral Lines in Electron-Beam-Produced Plasmas
- Regulation of Ankyrin Interaction with CD44 by Protein 4.1 in HeLa Cells
- Villous Adenoma of the Duodenum
- Etching of High-k Dielectric HfO2 Films in BCl3-Containing Plasmas Enhanced with O2 Addition
- Numerical Investigation on Origin of Microscopic Surface Roughness during Si Etching by Chemically Reactive Plasmas
- Novel virtual cytological analysis for the detection of endometrial cancer cells using autoscan fluoromicroscopy
- Numerical Study on Si Etching by Monatomic Br+/Cl+ Beams and Diatomic Br2+/Cl2+/HBr+ Beams
- Molecular Dynamics Simulation of Si Etching by Off-Normal Cl+ Bombardment at High Neutral-to-Ion Flux Ratios
- Molecular-Dynamics-Based Profile Evolution Simulation for Sub-10-nm Si Processing Technology
- Effect of Clearance Ratio in the Use of Open-Type Centrifugal Pump for Pumping of High-Viscosity Liquids
- UV〜Near-IR Laser Lines in Electron-Beam-Produced Rare Gas Plasmas
- Effects of Mask Pattern Geometry on Plasma Etching Profiles
- Laser Action of Ionized and Neutral Atomic Lines in Electron-Beam-Produced Rare Gas Plasmas
- On Early-Stage-Excitation Processes of KrII and XeII Lines in Pulsed-Electron-Beam Produced Plasmas
- A Model Analysis of Feature Profile Evolution and Microscopic Uniformity during Polysilicon Gate Etching in Cl2/O2 Plasmas
- An Atomic Scale Model of Multilayer Surface Reactions and the Feature Profile Evolution during Plasma Etching
- Modeling and Simulation of Nanoscale Surface Rippling during Plasma Etching of Si under Oblique Ion Incidence
- Plasma Diagnostics and Thrust Performance Analysis of a Microwave-Excited Microplasma Thruster
- An Improvement of Stillinger–Weber Interatomic Potential Model for Reactive Ion Etching Simulations
- Repetition Frequency Dependence of Wave Drag Reduction Induced by Laser-Pulse-Energy Depositions
- Microwave-Excited High-Density Plasma Column Sustained along Metal Rod at Negative Voltage