ITABASHI Naoshi | Central Research Laboratory, Hitachi, Ltd.
スポンサーリンク
概要
関連著者
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ITABASHI Naoshi
Central Research Laboratory, Hitachi, Ltd.
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Itabashi N
Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)
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Itabashi Naoshi
Central Research Laboratory Hitachi Ltd.
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YAMADA Chikashi
Institute for Laser Science, The University of Electro-Communications
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GOTO Toshio
Department of Quantum Engineering, Nagoya University
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HIROTA EIZI
Institute for Molecular Science
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ITABASHI Naoshi
Department of Electronics, Faculty of Engineering, Nagoya University
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NISHIWAKI Nobuki
Department of Electronics, Faculty of Engineering, Nagoya University
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Nishiwaki Nobuki
Department Of Electronics Faculty Of Engineering Nagoya University
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Goto Toshio
Department Of Electronics Faculty Of Engineering Nagoya University
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Hirota E
Guraduate Univ. Advanced Studies Yokohama
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Yamada Chikashi
Institute For Molecular Science
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Goto Toshio
Department Of Electronic Mechanical Engineering Nagoya University
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GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
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Yamamoto S
Univ. Tsukuba Ibaraki Jpn
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YAMAMOTO Seiji
Central Research Laboratory, Hitachi Ltd.
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MOCHIJI Kozo
Central Research Laboratory, Hitachi Ltd.
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OCHIAI Isao
Department of Physics,Faculty of Science,The University of Tokyo
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OCHIAI Isao
Central Research Laboratory, Hitachi, Ltd.
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Yamamoto Seiji
Central Research Laboratory Hitachi Ltd.
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Ochiai Isao
Central Research Laboratory Hitachi Ltd.
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Mochiji K
Joint Res. Center For Atom Technol. Angstrom Technol. Partnership(jrcat‐atp) Ibaraki Jpn
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Mochiji Kozo
Central Research Laboratory Hitachi Ltd.
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Ochiai I
Central Research Laboratory Hitachi Ltd.
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MAGANE Mitsuo
Department of Electronics, Faculty of Engineering, Nagoya University
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Magane Mitsuo
Department Of Electronics Faculty Of Engineering Nagoya University
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MATSUDA Akihisa
Electrotechnical Laboratory
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Kato K
Shizuoka Johoku Senior High School Shizuoka Jpn
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Ogawa Tohru
Technology Strategy Development Sony Co. Core Technology & Network Company
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ONO Tetsuo
Kasado Works, Hitachi, Ltd
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FUJII Takashi
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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Ono T
Osaka Univ. Osaka Jpn
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Matsuda A
Department Of Electrical And Electronic Engineering Faculty Of Engineering Toyama University
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MORI Masahito
Central Research Laboratory, Hitachi, Ltd.
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KATO Kozo
Department of Electronics, Faculty of Engineering, Nagoya University
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Fujii Takashi
Kasado Semiconductor Equipment Product Division Hitachi Ltd.
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TACHI Shin'ichi
Central Research Laboratory, Hitachi, Ltd.
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OHTANI Shunsuke
The University of Electro-Communications
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伊澤 勝
日立中研
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佐藤 知矢
Department Of Physics Faculty Of Science Shinshu University
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OHTANI Shunsuke
Institute for Laser Science, The University of Electro-Communications
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Takahashi Kazuo
Department of Electronic Science and Engineering, Kyoto University
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KOBAYASHI Nobuo
Department of Physics,Faculty of Science,Tokyo Metropolitan University
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Tawara H
Max Planck Inst. Nuclear Physics Saupfercheckweg Deu
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Ono Kouichi
Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University
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Eriguchi Koji
Department Of Aeronautics And Astronautics Graduate School Of Engineering Kyoto University
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SHIMIZU Hiroshi
Institute of Seismology and Volcanology, Kyushu University
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OSANO Yugo
Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University
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Noto K
Institute For Materials Research Tohoku University
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Kobayashi N
Tohoku Univ. Sendai Jpn
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KATO Yoshihiro
Department of Biochemistry and Engineering, Faculty of Engineering, Tohoku University
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Kobayashi N
Institute For Materials Research Tohoku University Katahira
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OKUNO Kazuhiko
Department of Physics,Tokyo Metropolitan University
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MOCHIJI Kozou
Central Research Laboratory, Hitachi, Ltd.
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ONO Tetsuo
Central Research Laboratory, Hitachi, Ltd.
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OGAWA Tarou
Central Research Laboratory, Hitachi Ltd.
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LEE Kaidee
Department of Chemistry, State University of New York
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HANSON David
Department of Chemistry, State University of New York
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KOFUJI Naoyuki
Central Research Laboratory, Hitachi, Ltd.
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TSUTSUMI Takashi
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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MATSUMOTO Eiji
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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FUJIMOTO Kotaro
Hitachi Techno Eng. Co., Ltd.
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IZAWA Masaru
Central Research Laboratory, Hitachi, Ltd.
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Ohtani S
Nagoya Univ. Nagoya Jpn
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Ohtani Shunsuke
Institute For Laser Science University Of Electro-communications
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Ohtani Shunsuke
Division Of Natural Sciences International Christian University Institute For Laser Science Universi
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Ohtani Shunsuke
Institute For Laser Science The University Of Electro-communications
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Shunsuke Ohtani
Cold Trapped Ions Project Icorp Japan Science And Technology Corporation (jst)
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Naito Susumu
Department Of Electronics Faculty Of Engineering Nagoya University
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Kobayashi Nobuo
Department Of Physics Faculty Of Science Tokyo Metropolitan University
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Saito Go
Kasado Semiconductor Equipment Product Division Hitachi Ltd.
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Lee Kaidee
Department Of Chemistry State University Of New York
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Ogawa Tarou
Central Research Laboratory Hitachi Ltd.
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Hanson David
Department Of Chemistry State University Of New York
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Mochiji Kozo
Central Research Laboratory Hitachi Ltd.:presto Research Development Corporation Of Japan (jrdc)
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Obara Satoshi
Photon Factory Institute For Material Structure Science
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Tanuma H
Department Of Physics Tokyo Metropolitan University
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Kofuji Naoyuki
Central Research Laboratory Hitachi Ltd.
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Okuno Kazuhiko
Department Of Physics Faculty Of Science Tokyo Metropolitan University
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ISHIMURA Hiroaki
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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AKIYAMA Hiroshi
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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YOSHIGAI Motohiko
Hitachi Techno Eng. Co., Ltd.
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KOJIMA Masayuki
Semiconductor & Integrated Circuit Division, Hitachi, Ltd.
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OKAMOTO Keiji
Hitachi ULSI Systems Co. Ltd.
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TSUJIMOTO Kazunori
Central Research Laboratory, Hitachi, Ltd.
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Ohtani Shunsuke
Cold Trapped Ion Project Japan Science & Technology Cooperation
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Mori Masahito
Central Research Laboratory Hitachi Ltd.
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TANUMA Hajime
Department of Physics, Tokyo Metropolitan University
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Ishimura Hiroaki
Kasado Semiconductor Equipment Product Division Hitachi Ltd.
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Yoshigai Motohiko
Hitachi Techno Eng. Co. Ltd.
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Tsujimoto Kazunori
Central Research Laboratory Hitachi Ltd
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Tsujimoto Kazunori
Central Research Laboratory Hitachi Ltd.
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Kojima Masayuki
Semiconductor & Integrated Circuit Division Hitachi Ltd.
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Kobayashi Nobuo
Department Of Electronic Engineering Faculty Of Engineering Yamanashi University
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Fujimoto Kotaro
Hitachi Techno Eng. Co. Ltd.
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Shimizu Hiroshi
Institute Of Seismology And Volcanology Kyushu University
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Ohtani Soichiro
Department Of Physics Faculty Of Science Hokkaido University:electronics Laboratory Nippon Mining Co
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Matsumoto Eiji
Kasado Semiconductor Equipment Product Division Hitachi Ltd.
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Kobayashi Nobuo
Deparment Of Physics Faculty Of Science Tokyo Metropolitan University
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Tsutsumi Takashi
Kasado Semiconductor Equipment Product Division Hitachi Ltd.
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Kato Y
Department Of Physics Tokyo Metropolitan University
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Akiyama Hiroshi
Kasado Semiconductor Equipment Product Division Hitachi Ltd.
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Kato Yoshihiro
Department Of Biochemistry And Engineering Faculty Of Engineering Tohoku University
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Ono Tetsuo
Central Research Laboratory Hitachi Ltd.
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Kobayashi Norio
Faculty Of Engineering Iwate University
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Ohtani Shunsuke
Institute for Laser Science (ILS), University of Electro-Communications, 1-5-1 Chofugaoka, Chofu, Tokyo 182-8585, Japan
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Izawa Masaru
Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
著作論文
- Positive Charge Generation at a SiO_2/Si Interface due to Bombardment with Metastable Atoms
- Thermal and Ion-Induced Reactions on a Chlorine-Adsorbed GaAs (100) Surface Studied by Metastable-Atom De-excitation Electron Spectroscopy
- Surface Reaction Induced by Multiply-Charged Ions
- Photon-Stimulated Ion Desorption from Semiconductor Surfaces
- 240-nm Pitch Aluminum Interconnects Formation by UHF-ECR Plasma Etching Incorporating TM Bias and Novel-Gas Chemistry
- Precise CD-Controlled Gate Etching Using UHF-ECR Plasma
- Measurements of the CF Radical in DC Pulsed CF_4/H_2 Discharge Plasma Using Infrared Diode Laser Absorption Spectroscopy
- Spatial Distribution of SiH_3 Radicals in RF Silane Plasma
- SiH_3 Radical Density in Pulsed Silane Plasma
- Diffusion Coefficient and Reaction Rate Constant of the SiH_3 Radical in Silane Plasma
- Measurement of the SiH_3 Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy : Techniques, Instrumentations and Measurement
- A Model Analysis of Feature Profile Evolution and Microscopic Uniformity during Polysilicon Gate Etching in Cl_2/O_2 Plasmas
- Desorption of Ga and As Atoms from GaAs Surface Induced by Slow Multiply Charged Ar Ions