IZAWA Masaru | Central Research Laboratory, Hitachi, Ltd.
スポンサーリンク
概要
関連著者
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IZAWA Masaru
Central Research Laboratory, Hitachi, Ltd.
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Izawa Masaru
Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
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Negishi Nobuyuki
Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
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伊澤 勝
日立中研
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ITABASHI Naoshi
Central Research Laboratory, Hitachi, Ltd.
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KOFUJI Naoyuki
Central Research Laboratory, Hitachi, Ltd.
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TSUTSUMI Takashi
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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MATSUMOTO Eiji
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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FUJIMOTO Kotaro
Hitachi Techno Eng. Co., Ltd.
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FUJII Takashi
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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Kofuji Naoyuki
Central Research Laboratory Hitachi Ltd.
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Kanekiyo Tadamitsu
Kasado Division Hitachi High-technologies Corporation
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Itabashi Naoshi
Central Research Laboratory Hitachi Ltd.
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Fujimoto Kotaro
Hitachi Techno Eng. Co. Ltd.
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Matsumoto Eiji
Kasado Semiconductor Equipment Product Division Hitachi Ltd.
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Tsutsumi Takashi
Kasado Semiconductor Equipment Product Division Hitachi Ltd.
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Fujii Takashi
Kasado Semiconductor Equipment Product Division Hitachi Ltd.
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Kanekiyo Tadamitsu
Kasado Division, Hitachi High-Technologies Corp., 794 Toyoi, Kudamatsu, Yamaguchi 744-0002, Japan
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Miyake Masatoshi
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Negishi Nobuyuki
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Oyama Masatoshi
Kasado Division, Hitachi High-Technologies Corp., 794 Toyoi, Kudamatsu, Yamaguchi 744-0002, Japan
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TACHI Shin'ichi
Central Research Laboratory, Hitachi, Ltd.
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Izawa Masaru
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Maeda Kenji
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Momonoi Yoshinori
Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
著作論文
- 240-nm Pitch Aluminum Interconnects Formation by UHF-ECR Plasma Etching Incorporating TM Bias and Novel-Gas Chemistry
- Real Time Estimation and Control of Oxide-Etch Rate Distribution Using Plasma Emission Distribution Measurements
- Effects of Mask and Necking Deformation on Bowing and Twisting in High-Aspect-Ratio Contact Hole Etching
- Investigation of Bowing Reduction in SiO2 Etching Taking into Account Radical Sticking in a Hole