Negishi Nobuyuki | Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan

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概要

• Negishi Nobuyukiの詳細を見る
• 同名の論文著者
• Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japanの論文著者

関連著者

• Negishi Nobuyuki

  Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan

• IZAWA Masaru

  Central Research Laboratory, Hitachi, Ltd.

• Kofuji Naoyuki

  Central Research Laboratory Hitachi Ltd.

• Izawa Masaru

  Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan

• Kamibayashi Masami

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Mori Masahito

  Semiconductor Manufacturing Equipment Division, Hitachi High-Technologies Corporation, Minato, Tokyo 105-8717, Japan

• Kanekiyo Tadamitsu

  Kasado Division Hitachi High-technologies Corporation

• KOBAYASHI Hiroyuki

  Central Research Institute, Mitsubishi Materials Corporation

• Suzuki Keizo

  Central Research Laboratory Hitachi Limited

• Kanekiyo Tadamitsu

  Kasado Division, Hitachi High-Technologies Corp., 794 Toyoi, Kudamatsu, Yamaguchi 744-0002, Japan

• Miyake Masatoshi

  Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan

• Negishi Nobuyuki

  Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan

• Oyama Masatoshi

  Kasado Division, Hitachi High-Technologies Corp., 794 Toyoi, Kudamatsu, Yamaguchi 744-0002, Japan

• Negishi Nobuyuki

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Nagaishi Hideyuki

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Tandou Takumi

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Kobayashi Hiroyuki

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Izawa Masaru

  Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan

• Momonoi Yoshinori

  Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan

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著作論文

• Effects of Mask and Necking Deformation on Bowing and Twisting in High-Aspect-Ratio Contact Hole Etching
• Decrease in Ozone Density of Atmospheric Surface-Discharge Plasma Source
• Negative Impact of Etched Si Area on Selectivity and Positive Impact of Photoelectric Current on Etched Profile in Gate Etching with Different Wafer Bias Frequencies
• Investigation of Bowing Reduction in SiO2 Etching Taking into Account Radical Sticking in a Hole
• Negative Impact of Etched Si Area on Selectivity and Positive Impact of Photoelectric Current on Etched Profile in Gate Etching with Different Wafer Bias Frequencies

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