Izawa Masaru | Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
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概要
- Izawa Masaruの詳細を見る
- 同名の論文著者
- Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japanの論文著者
関連著者
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IZAWA Masaru
Central Research Laboratory, Hitachi, Ltd.
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Izawa Masaru
Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
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Negishi Nobuyuki
Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
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伊澤 勝
日立中研
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ITABASHI Naoshi
Central Research Laboratory, Hitachi, Ltd.
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KOFUJI Naoyuki
Central Research Laboratory, Hitachi, Ltd.
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TSUTSUMI Takashi
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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MATSUMOTO Eiji
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
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FUJIMOTO Kotaro
Hitachi Techno Eng. Co., Ltd.
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FUJII Takashi
Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.
著作論文
- 240-nm Pitch Aluminum Interconnects Formation by UHF-ECR Plasma Etching Incorporating TM Bias and Novel-Gas Chemistry
- Real Time Estimation and Control of Oxide-Etch Rate Distribution Using Plasma Emission Distribution Measurements
- Effects of Mask and Necking Deformation on Bowing and Twisting in High-Aspect-Ratio Contact Hole Etching
- Investigation of Bowing Reduction in SiO2 Etching Taking into Account Radical Sticking in a Hole