Kofuji Naoyuki | Central Research Laboratory Hitachi Ltd.

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概要

• KOFUJI Naoyukiの詳細を見る
• 同名の論文著者
• Central Research Laboratory Hitachi Ltd.の論文著者

関連著者

• Kofuji Naoyuki

  Central Research Laboratory Hitachi Ltd.

• KOFUJI Naoyuki

  Central Research Laboratory, Hitachi, Ltd.

• Negishi Nobuyuki

  Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan

• Kamibayashi Masami

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan

• Mori Masahito

  Semiconductor Manufacturing Equipment Division, Hitachi High-Technologies Corporation, Minato, Tokyo 105-8717, Japan

• 伊澤 勝

  日立中研

• ITABASHI Naoshi

  Central Research Laboratory, Hitachi, Ltd.

• TSUTSUMI Takashi

  Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.

• MATSUMOTO Eiji

  Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.

• FUJIMOTO Kotaro

  Hitachi Techno Eng. Co., Ltd.

• IZAWA Masaru

  Central Research Laboratory, Hitachi, Ltd.

• FUJII Takashi

  Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.

• Miura Hideo

  Fracture And Reliability Research Institute Graduate School Of Engineering Tohoku University

• TSUJIMOTO Kazunori

  Central Research Laboratory, Hitachi, Ltd.

• Itabashi Naoshi

  Central Research Laboratory Hitachi Ltd.

• Kumihashi Takao

  Central Research Laboratory, Hitachi, Ltd.

• Kumihashi T

  Hitachi Ltd. Tokyo Jpn

• Tsujimoto Kazunori

  Central Research Laboratory Hitachi Ltd

• Fujimoto Kotaro

  Hitachi Techno Eng. Co. Ltd.

• Matsumoto Eiji

  Kasado Semiconductor Equipment Product Division Hitachi Ltd.

• Tsutsumi Takashi

  Kasado Semiconductor Equipment Product Division Hitachi Ltd.

• Fujii Takashi

  Kasado Semiconductor Equipment Product Division Hitachi Ltd.

• TACHI Shin'ichi

  Central Research Laboratory, Hitachi, Ltd.

• Kofuji Naoyuki

  Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan

• Izawa Masaru

  Central Research Laboratory, Hitachi Ltd., 1-280 Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan

• MIURA Hideo

  Fracture and Reliability Research Institute (FRRI), Graduate School of Engineering, Tohoku University

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著作論文

• 240-nm Pitch Aluminum Interconnects Formation by UHF-ECR Plasma Etching Incorporating TM Bias and Novel-Gas Chemistry
• Reduction in Microloading by High-Gas-Flow-Rate Electron Cyclotron Resonance Plasma Etching
• Negative Impact of Etched Si Area on Selectivity and Positive Impact of Photoelectric Current on Etched Profile in Gate Etching with Different Wafer Bias Frequencies
• Investigation of Mask Inclination Due to Oxygen-Radical Irradiation during Resist Trimming
• Negative Impact of Etched Si Area on Selectivity and Positive Impact of Photoelectric Current on Etched Profile in Gate Etching with Different Wafer Bias Frequencies

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