Thermal and Ion-Induced Reactions on a Chlorine-Adsorbed GaAs (100) Surface Studied by Metastable-Atom De-excitation Electron Spectroscopy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-07-15
著者
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Yamamoto S
Univ. Tsukuba Ibaraki Jpn
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Ogawa Tohru
Technology Strategy Development Sony Co. Core Technology & Network Company
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YAMAMOTO Seiji
Central Research Laboratory, Hitachi Ltd.
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MOCHIJI Kozo
Central Research Laboratory, Hitachi Ltd.
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ONO Tetsuo
Kasado Works, Hitachi, Ltd
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OCHIAI Isao
Department of Physics,Faculty of Science,The University of Tokyo
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ITABASHI Naoshi
Central Research Laboratory, Hitachi, Ltd.
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OCHIAI Isao
Central Research Laboratory, Hitachi, Ltd.
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ONO Tetsuo
Central Research Laboratory, Hitachi, Ltd.
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Yamamoto Seiji
Central Research Laboratory Hitachi Ltd.
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Ono T
Osaka Univ. Osaka Jpn
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Itabashi N
Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)
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Ochiai Isao
Central Research Laboratory Hitachi Ltd.
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Mochiji K
Joint Res. Center For Atom Technol. Angstrom Technol. Partnership(jrcat‐atp) Ibaraki Jpn
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Mochiji Kozo
Central Research Laboratory Hitachi Ltd.
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Itabashi Naoshi
Central Research Laboratory Hitachi Ltd.
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Ochiai I
Central Research Laboratory Hitachi Ltd.
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Ono Tetsuo
Central Research Laboratory Hitachi Ltd.
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