Application of Zirconium Silicon Oxide Films to an Attenuated Phase-Shifting Mask in ArF Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-30
著者
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Ogawa T
Faculty Of Engineering Takushoku University
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Takeuchi Susumu
Toppan Printing Co. Ltd.
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Ogawa Tohru
Technology Strategy Development Sony Co. Core Technology & Network Company
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MATSUO Takahiro
Semiconductor Leading Edge Technologies, Inc.
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ONODERA Toshio
Semiconductor Leading Edge Technologies, Inc.
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NAKAZAWA Keisuke
Semiconductor Leading Edge Technologies, Inc.
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OGAWA Tohru
Semiconductor Leading Edge Technologies, Inc.
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MORIMOTO Hiroaki
Semiconductor Leading Edge Technologies, Inc.
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HARAGUCHI Takashi
Toppan Printing Co., Ltd.
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FUKUHARA Nobuhiko
Toppan Printing Co., Ltd.
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MATSUO Tadashi
Toppan Printing Co., Ltd.
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OTAKI Masao
Toppan Printing Co., Ltd.
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Matsuo Tadashi
Toppan Printing Co. Lid.
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Haraguchi Takashi
Toppan Printing Co. Ltd.
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Matsuo T
Semiconductor Leading Edge Technologies Inc
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Takahashi M
Tokyo Univ. Pharmacy And Life Sci. Tokyo Jpn
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Takahashi M
Semiconductor Leading Edge Technologies Inc
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Otaki Masao
Toppan Printing Co. Ltd.
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Nakazawa K
Process & Manufacturing Engineering Center Toshiba Co. Semicoundactor Company
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Morimoto H
Semiconductor Leading Edge Technologies Inc.
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Fukuhara Nobuhiko
Toppan Printing Co. Ltd.
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