Challenges to 0.1 μm Resolution Capability in ArF Single Layer Resist Process with Weak Resolution Enhancement Techniques
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-30
著者
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TAKAHASHI Makoto
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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OHFUJI Takeshi
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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SASAGO Masaru
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Matsuo T
Semiconductor Leading Edge Technologies Inc
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KISHIMURA Shinji
Yokohama Research Center, Association of Super-Advanced Electronics Technologies
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Kishimura Sinji
Association Of Super-advanced Electronics Technologies:(present Address)ulsi Technology Development
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Takahashi M
Tokyo Univ. Pharmacy And Life Sci. Tokyo Jpn
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Takahashi M
Semiconductor Leading Edge Technologies Inc
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Sasago Masaru
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address)uls
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Ohfuji T
Semiconductor Leading Edge Technologies Inc. (selete)
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Sasago M
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Sasago M
Matsushita Electric Industrial Corp. Ltd.
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